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Vapor Deposition Device

A technology of vapor phase growth and components, applied in the direction of electrical components, gaseous chemical plating, vacuum evaporation plating, etc., can solve problems such as costing a lot of effort and time, gear chipping, etc., and achieve automatic disassembly and assembly, reliable transition, Eliminates the effect of meshing operations

Active Publication Date: 2015-01-14
NIPPON SANSO CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In the above-mentioned rotation-revolution type vapor phase growth apparatus, when the revolving base is removed for substrate replacement work or maintenance work, since the meshing of the fixed internal gear and the external gear is disengaged, the revolving base is installed after the operation. In this case, the fixed internal gear and the external gear must be meshed into a specified state by manual operation. In the case of a large number of rotation bases, it takes a lot of work and time to confirm the meshing state.
In addition, when the fixed internal gear and external gear are in a non-meshing state, the rotation base becomes a state of being greatly inclined, and a large force acts on the gear, which may cause tooth chipping.

Method used

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Examples

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Embodiment Construction

[0027] Figure 1 to Figure 8 The vapor phase growth apparatus shown is for showing the first embodiment of the present invention. The vapor-phase growth apparatus is provided with a base 12 in such a way that the disk-shaped base 12 can rotate in the chamber 11, and includes: ring-shaped bearing members 13, which are respectively arranged on the sides of the base 12. Inside a plurality of circular openings 12a formed in the circumferential direction of the outer peripheral portion; an external gear member (rotation base) 14, which is mounted on each bearing in a rotatable manner by means of a plurality of rolling members (balls) 13a member 13; an annular fixed internal gear member 15 meshing with the external gear member 14; device) 17; a flow channel (flow channel) 18 that guides the raw material gas in a direction parallel to the surface of the above-mentioned substrate 16.

[0028] A shaft member 19 for rotating the base 12 is provided at the lower central portion of the ...

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Abstract

Disclosed is a rotation / revolution type vapor phase growth apparatus that allows for automatic meshing between an external gear and an internal gear. In the apparatus, on tooth side surfaces of at least one kind of a plurality of external gear members provided rotatably in a circumferential direction of an outer periphery of a disk-shaped susceptor and a ring-shaped fixed internal gear member having an internal gear to mesh with the external gear members, there is provided a guide slope that abuts against a tooth side surface of the other kind of the gear member(s) to guide both kinds of the gear members into a meshed state when both kinds of the gear members move from a non-meshed state to the meshed state.

Description

technical field [0001] The present invention relates to a vapor phase growth apparatus. More specifically, the present invention relates to a vapor phase growth apparatus of a rotation-revolving type that vapor-grows a semiconductor thin film on a substrate surface while rotating and revolving a substrate. Background technique [0002] As a vapor phase growth apparatus that performs vapor phase growth on a plurality of substrates at a time, there is known a vapor phase growth apparatus of the rotation and revolution type: a plurality of rotation bases are arranged in the peripheral direction of the outer periphery of the rotation base, and on the outer periphery of the rotation base An external gear is provided in the upper part, and the substrate during film formation is rotated and revolved by meshing the external gear with a fixed internal gear provided in the chamber (for example, refer to Patent Document 1.). [0003] patent documents [0004] Patent Document 1: Japane...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/205C23C16/458H01L21/683
CPCH01L21/68771C23C14/505H01L21/68764C23C16/4584H01L21/67109
Inventor 山口晃内山康右
Owner NIPPON SANSO CORP
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