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Device for thermally treating substrates

A technology for substrates and processing chambers, applied in the field of heat treatment inner chambers, can solve problems such as damage to sensitive components, and achieve the effect of simplifying costs and low-cost production operations

Inactive Publication Date: 2013-01-02
LEYBOLD OPTICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This is then particularly problematic when the heat treatment inner chamber is surrounded by further chambers, for example a vacuum chamber, since it experiences heating which can lead to damage to the vacuum vessel and the sensitive components contained therein

Method used

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  • Device for thermally treating substrates
  • Device for thermally treating substrates

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Embodiment Construction

[0031] Mutually corresponding elements in the figures are marked with the same reference numerals. The figures represent embodiments schematically and do not repeat specific parameters of the invention. Furthermore, the drawings are only used to illustrate an advantageous embodiment of the invention, and it is not to be understood that the drawings limit the scope of protection of the invention.

[0032] figure 1 and 2 A perspective sectional view of a processing chamber 1 for thermally processing a substrate 20 is shown. The term "substrate" is to be understood here as any object to be treated, coated and / or coated, i.e. not only a (possibly pretreated) carrier material like this but also Support materials with single or multiple coatings are possible. exist figure 1 and 2 In an embodiment, the substrate is a flat workpiece, and the area of ​​the workpiece may be between several square centimeters and several square meters.

[0033] Preferably, the substrate 20 can als...

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Abstract

The invention relates to an inner heat treatment chamber (3) for thermally processing a substrate (20), comprising walls (10) that surround an inner space (24) of the inner heat treatment chamber (3), a storage unit (8) for storing the substrate (20) during the thermal processing and an energy source (11) for introducing energy into the inner space (24) of the inner heat treatment chamber (3), wherein at least a part of the inner sides of the walls (10) is designed to reflect power introduced by the energy source (11). The at least one part of the inner sides of the walls (10) is made of a material that reflects at least infrared radiation to a high degree. The invention further relates to an inner heat treatment chamber (3) for thermally processing a substrate (20), comprising walls (10) that surround an inner space (24) of the inner heat treatment chamber (3), a storage unit (8) for storing the substrates (20) during the thermal processing and an energy source (11) for introducing energy into the inner space (24) of the inner heat treatment chamber, wherein a cooling device (14) is provided for cooling the walls (10).

Description

technical field [0001] The invention relates to a heat treatment chamber for heat treatment of substrates according to the preamble of claim 1 , as described, for example, in comparable US Pat. No. 6,703,589 B1. Furthermore, the invention relates to a treatment cabinet according to the preamble of claim 18 having a heat treatment interior which is arranged in the outer chamber and which is suitable for the heat treatment of substrates. Background technique [0002] Usually, some process steps are necessary during the surface treatment of the substrate, in which the substrate (and possibly the coating on the substrate) coating) subjected to thermal pretreatment and / or posttreatment. For this purpose, the substrate is usually heated to the desired temperature by means of a heat source and kept at this temperature for a predetermined time. [0003] A method for subjecting workpieces to temperature is disclosed in DE 10304774 B3, in which the workpieces are accommodated in a c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00
CPCH01L21/67109F27D11/12H01L21/67115
Inventor A·卡斯帕瑞S·汉高J·特鲁布S·史蒂勒M·福范格尔
Owner LEYBOLD OPTICS
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