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Chemical vapor deposition device used for flat-panel display

A chemical vapor deposition, flat panel display technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of dead space increasing device occupied area, large dead space, confusion and other problems, and achieve improved deposition quality effect

Inactive Publication Date: 2013-03-20
SFA ENG CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0017] However, since the slit valve is manufactured separately and assembled to the outer wall of the vacuum chamber 1, the outer wall of the vacuum chamber 1 to which the slit valve is assembled is not the same as the valve chamber (not shown) in which the slit valve is housed. The dead space between the outer walls of the
[0018] Therefore, there is a high risk of messing up the process results near the slit valve, and unnecessary dead space increases the footprint of the entire device

Method used

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  • Chemical vapor deposition device used for flat-panel display
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  • Chemical vapor deposition device used for flat-panel display

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Embodiment Construction

[0131] In order to fully understand the present invention and its advantages, reference is now made to the accompanying drawings, which illustrate various embodiments of the invention.

[0132] Hereinafter, the present invention will be explained in detail by explaining embodiments of the invention with reference to the accompanying drawings. Like reference numbers in the figures indicate like elements.

[0133] Before describing with reference to the accompanying drawings, a flat panel display to be described below may include any one of a liquid crystal display (LCD), a plasma display panel (PDP), and an organic light emitting diode (OLED).

[0134] However, in the following exemplary embodiments, a large glass substrate for an OLED will be considered as a flat panel display by way of example. In addition, "large" refers to a size of about 3 meters in width and length for the 11th generation substrate.

[0135] For convenience, a large glass substrate for OLED will be simp...

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Abstract

The invention discloses a chemical vapor deposition (CVD) device. The device comprises a base used to support a substrate, a vacuum chamber, and a vacuum draw control unit. In the vacuum chamber,a deposition technology is performed on the substrate, and the vacuum chamber comprises cylinder through-holes disposed on a central area on a bottom and a vacuum draw port which is disposed at an interval with thecylinder through-holes. Cylinders used to move the base up and down are disposed through the cylinder through-holes. The vacuum draw control unit is connected with the vacuum draw port and controls drawing positions in the vacuum chamber.

Description

[0001] Cross References to Related Applications [0002] This application is based on Korean Patent Application No. 10-2011-0089405 filed with the Korean Intellectual Property Office on September 5, 2011, and Korean Patent Application No. 10-2011 filed with the Korean Intellectual Property Office on September 16, 2011. 2011-0093366, the contents of which are incorporated herein by reference in their entirety. technical field [0003] The present invention relates to a chemical vapor deposition device for flat panel displays, and more particularly, to a chemical vapor deposition device for flat panel displays in which the suction position in a vacuum chamber is adjusted so that The pressure distribution is uniform, thus improving the deposition quality to the substrate and structurally improving the slit valve assembly used to insert or remove substrates relative to the vacuum chamber. Background technique [0004] Flat panel displays have been widely used as displays for te...

Claims

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Application Information

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IPC IPC(8): C23C16/44
Inventor 金荣敏李春秀权泰均朴美星郑元基
Owner SFA ENG CORP
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