Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing anti-fungal composition

A composition, antifungal technology, applied in the direction of antifungal agents, etc., can solve problems such as drug resistance

Inactive Publication Date: 2013-04-03
王便草
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Currently available antifungal drugs are often only temporarily suppressive and can cause resistance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0012] The antifungal composition of the present embodiment is made up of the component of following percentage by weight:

[0013] Chlorhexidine 0.5% Chlorhexidine acetate 0.1% Sodium dodecyl benzene sulfonate 0.1% Isopropanol 2% The balance is sterile water.

[0014] The preparation method of the antifungal composition of the present embodiment may further comprise the steps:

[0015] (1) Add 0.5% chlorhexidine and 0.1% chlorhexidine acetate to an appropriate amount of sterile water and mix well;

[0016] (2) Add 0.1% sodium dodecylbenzenesulfonate and 2% isopropanol to an appropriate amount of sterile water, heat to about 40°C and stir until a clear solution is obtained;

[0017] (3) Mix the mixture of step (1) and step (2), and add water to make up to 100% to obtain the finished product.

Embodiment 2

[0019] The antifungal composition of the present embodiment is made up of the component of following percentage by weight:

[0020] Chlorhexidine 1% Chlorhexidine acetate 0.15% Sodium dodecyl benzene sulfonate 2% Isopropanol 6% The balance is sterile water.

[0021] The preparation method of the antifungal composition of the present embodiment may further comprise the steps:

[0022] (1) Add 1% chlorhexidine and 0.15% chlorhexidine acetate to an appropriate amount of sterile water and mix well;

[0023] (2) Add 2% sodium dodecylbenzenesulfonate and 6% isopropanol to an appropriate amount of sterile water, heat to about 40°C and stir until a clear solution is obtained;

[0024] (3) Mix the mixture of step (1) and step (2), and add water to make up to 100% to obtain the finished product.

Embodiment 3

[0026] The antifungal composition of the present embodiment is made up of the component of following percentage by weight:

[0027] Chlorhexidine 1.5% Chlorhexidine acetate 0.3% Sodium dodecyl benzene sulfonate 3.0% Isopropanol 15% The balance is sterile water.

[0028] The preparation method of the antifungal composition of the present embodiment may further comprise the steps:

[0029] (1) Add 1.5% chlorhexidine and 0.3% chlorhexidine acetate to an appropriate amount of sterile water and mix well;

[0030] (2) Add 3.0% sodium dodecylbenzenesulfonate and 15% isopropanol into an appropriate amount of sterile water, heat to about 40°C and stir until a clear solution is obtained;

[0031] (3) Mix the mixture of step (1) and step (2), and add water to make up to 100% to obtain the finished product.

[0032] Taking the fungal inhibition rate as an investigation index, the fungal inhibition rate of the antifungal composition prepared by the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for preparing an anti-fungal composition, comprising the following steps: (1) adding 0.5-1.5% chlorhexidine and 0.1-0.3% chlorhexidine acetate to an appropriate amount of sterile water, and mixing uniformly; (2) adding 0.1-3.0% sodium dodecyl benzene sulfonate and 2-15% isopropanol to an appropriate amount of sterile water, heating to the temperature of about 40 DEG C, and stirring until a clear solution is obtained; and (3) mixing the mixture obtained in the step (1) and the mixture obtained in the step (2), and adding water to make up to 100% to obtain the finished product. The anti-fungal composition prepared by adopting the method can inhibit more than 98% of fungi.

Description

technical field [0001] The invention relates to a preparation method of an antifungal composition. Background technique [0002] A small group of fungi can cause disease in humans and animals, especially dermatophytosis such as tinea manuum, tinea pedis, tinea corporis, etc. Although systemic fungal infections are relatively rare, the mortality rate is high. Opportunistic fungal diseases can also occur in immunocompromised patients. The treatment of fungal infection has always been a difficult problem in the medical field. Currently available antifungal drugs are often only temporarily suppressive and can induce resistance. Therefore, the prevention of fungal infection is more important. Contents of the invention [0003] The object of the present invention is to provide a preparation method of the antifungal composition. The prepared composition can be used to prevent fungal infection in humans and animals, and the fungal inhibition rate exceeds 98%. [0004] Antifu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K31/155A61P31/10
Inventor 王便草
Owner 王便草
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com