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Drying method of mask after cleaning

A drying method and mask technology, applied in the direction of drying solid materials, drying solid materials without heating, drying, etc., can solve problems such as secondary pollution of MASK, and achieve the effect of avoiding secondary pollution

Inactive Publication Date: 2013-04-03
IRICO FOSHAN FLAT PANEL DISPLAY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the blower (or alcohol, etc.) must be sufficiently clean to ensure the cleanliness of the MASK after drying, otherwise it will cause secondary pollution to the MASK

Method used

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  • Drying method of mask after cleaning

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Embodiment Construction

[0008] Such as figure 1 As shown, the present invention is a method for drying a mask after cleaning, comprising the following steps: fixing the cleaned mask 1 on a jig 2 and fully immersing it in pure water, the jig 2 and the slow moving device 4 Connect so that the fixture 2 and the mask plate 1 can be lifted slowly and steadily to leave the water surface 3, and the lifting speed is controlled at 10-70mm / min to lift at a constant speed until the mask plate 1 is completely separated from the pure water surface 3, for example, by Lift at a constant speed of 50mm / min.

[0009] Wherein the mask 1 is rectangular, the plane where the mask 1 is located is perpendicular to the water surface 3 of pure water, and the straight line where the long side of the mask 1 is located obliquely intersects with the water surface 3 of pure water at an angle of 10-30 degrees.

[0010] It has been proved by experiments that when the lifting speed of the mask plate 1 is 10-70 mm / min, the pure water...

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Abstract

The invention relates to a drying method of a mask after cleaning. The drying method is characterized by comprising the following steps: fixing a cleaned mask (1) on a clamp (2) and completely dipping in pure water, wherein the clamp (2) is connected with a low-speed moving device (4) so that the clamp (2) and the mask (1) can be lifted at a stable low speed so as to be higher than water surface (3); and controlling the lifting speed at a constant speed of 10-70 mm / min to carry out lifting till the mask (1) is completely higher than the water surface (3) of purified water. After the method is adopted, without air blowing (or volatile solvents such as alcohol and the like), the existing completely cleaned purified water for rinsing is utilized, and dry surface can be ensured after the mask comes out from a purified water rinsing tank, so that secondary pollution of the mask after subsequent drying process is avoided.

Description

technical field [0001] The invention relates to a drying method after mask plate cleaning. Background technique [0002] The mask plate (MASK) used in the exposure process in the graphic manufacturing process of flat panel display devices is usually plated with chromium on quartz glass, and then the required graphics are produced on the chromium layer. After the MASK is dirty, it must be cleaned, and it must be ensured that no stains remain on the MASK after cleaning, otherwise, every product will have the same defect. The usual cleaning method is cleaning with detergent, rinsing with pure water, rinsing with pure water, etc., and then drying with air blowing (or volatile solvents such as alcohol). However, the blower (or alcohol, etc.) must be sufficiently clean to ensure the cleanliness of the MASK after drying, otherwise it will cause secondary pollution to the MASK. Contents of the invention [0003] The purpose of the present invention is to provide a method for dry...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F26B5/00
Inventor 张东玲
Owner IRICO FOSHAN FLAT PANEL DISPLAY
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