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Quantum dot exposure plate and photolithography technique with the same

A technology of quantum dots and exposure plates, which is applied in the photoengraving process of the pattern surface, the microlithography exposure equipment, the originals used for photomechanical processing, etc.

Inactive Publication Date: 2013-05-15
TAIWAN MEMORY CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, as far as the photomask exposure method that has been used for many years is concerned, it has gradually been unable to cope with the huge production cost and process considerations of the current nano-semiconductor generation.

Method used

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  • Quantum dot exposure plate and photolithography technique with the same
  • Quantum dot exposure plate and photolithography technique with the same
  • Quantum dot exposure plate and photolithography technique with the same

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Embodiment Construction

[0043] Embodiments of the invention will now be described in detail by way of example depicted in the accompanying drawings. However, the description is not intended to limit the present invention to the embodiments described below, and the embodiments herein are provided so that readers can easily and completely understand the scope and spirit of the present invention. In the diagrams, the size and proportion of some components and structures are exaggerated for clarity. Readers should understand that other embodiments may be utilized in the present invention or structural, logical, and electrical changes may be made without departing from the described embodiments. Accordingly, the following detailed description is not to be viewed as limiting, but rather, the embodiments contained therein are defined by the appended claims.

[0044] now refer to figure 2 , which shows a schematic top view of a quantum dot exposure plate 200 in an embodiment of the present invention. lik...

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Abstract

The invention discloses a quantum dot exposure plate. The quantum dot exposure plate comprises a base plate, a quantum dot array, a plurality of row control lines and a plurality of column control lines. The row control lines and the column control lines can control corresponding quantum dots to emit light, and thus the quantum dot array presents a light-emitting graph so as to expose a light resistance in a photomask-free environment.

Description

technical field [0001] The present invention relates to a quantum dot exposure plate, more specifically, it relates to an exposure plate with a quantum dot array on which light of a predetermined pattern can be presented for use in an exposure process. Background technique [0002] In the traditional semiconductor process, if various fine circuit structures are to be formed on the substrate, it generally uses a photolithography process to first define the circuit pattern on the photoresist, and then etches the circuit pattern on the photoresist. Transfer to the deposited layer structure to complete the fabrication of the circuit. [0003] As far as the current general photolithography process is concerned, such as figure 1 As shown, it shows a schematic diagram of photoresist exposure and development steps in a conventional photolithography process. Before exposing the photoresist layer 120 , in order to define the light-receiving part and the non-light-receiving part of t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/00G03F7/20
Inventor 戎乐天
Owner TAIWAN MEMORY CORP