Atomic beam two-dimension cooling optical prism frame

A prism and optical technology, applied in the field of atomic lithography, can solve the problems of increased cost, unfavorable atomic lithography deposition experiments, difficult conical prism technology, etc., to ensure accuracy, ensure compatibility and high integration, and facilitate detection. Effect

Inactive Publication Date: 2013-05-22
TONGJI UNIV
View PDF4 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of the first method is that it needs to make major changes to the original experimental equipment, which increases the cost; the disadvantage of the second method is that the incident direction of the laser is the same as the direction of the atomic beam, which is not conducive to the subsequent deposition experiments of atomic lithography. And the technical difficulty of conical prism preparation is great

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Atomic beam two-dimension cooling optical prism frame
  • Atomic beam two-dimension cooling optical prism frame
  • Atomic beam two-dimension cooling optical prism frame

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] The composition of the present invention comprises a pentaprism and three reflecting mirrors, the material is all quartz, the angle tolerance of the pentaprism is guaranteed to be within 10 seconds, and a circular hole with a diameter of 12 mm is dug out in the middle of the pentaprism to facilitate the passage of the atomic beam. The reflective mirror is coated with a high-reflection film to ensure a reflectivity of more than 97%.

[0026] The present invention uses a pentaprism as the basic structure, and glues the side of the reflective mirror coated with a high-reflection film on three specific faces of the pentaprism with ultraviolet glue. A surface and a surface through which light is transmitted.

[0027] When gluing, the reflector extends out of the pentaprism, the extension length is 30mm, and the extension part is on the same side. The laser beam is completely transmitted in the air medium, reducing loss and interference. This laser beam is used to cool the a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
reflectanceaaaaaaaaaa
Login to view more

Abstract

The invention provides an atomic beam two-dimension cooling optical prism frame which comprises a pentaprism, a first reflector, a second reflector and a third reflector, wherein the first reflector, the second reflector and the third reflector are respectively bound on the pentaprism, a reflecting face extends out of a prism on the same side, a bonding face is the pentaprism, and two faces which are reflected by a medium light line and any face of two faces of light transmission are used. The atomic beam two-dimension cooling optical prism frame has the advantages of being capable of achieving two-dimension cooling alignment of an atomic beam, providing a high, accurate and straight atomic source, ensuring compatibility and high integration of an existing experimental device, not transforming a vacuum chamber, saving cost, having expansibility, and providing an achieving means for two-dimension atomic photoetching.

Description

technical field [0001] The invention belongs to the technical field of atomic lithography, and relates to an optical prism frame, which can realize lateral two-dimensional cooling and collimation of atomic beams. Background technique [0002] In the field of atomic lithography, the realization of two-dimensional atomic lithography requires two-dimensional cooling and collimation of the atomic beam. The two-dimensional laser cooling technology can be used to realize the two-dimensional cooling and collimation of the atomic beam. The laser cooling technology utilizes the radiation field and The dynamic effect of matter interaction has the advantage of compressing the divergence angle without reducing the atomic beam flux. [0003] At present, the realization of two-dimensional laser cooling technology mainly has the following two background technologies: one is to open windows in the horizontal and vertical directions of the vacuum chamber, and to introduce two pairs of coolin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B7/182G02B7/18G03F7/20
Inventor 马艳张万经
Owner TONGJI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products