Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Etching method

A technology of etching and etching solution, which is applied in the field of chemical etching processing, and can solve problems such as affecting visual effects and processing workpieces with poor hand feeling

Inactive Publication Date: 2013-06-26
GUANGDONG UNIV OF TECH
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The graphics processed by this etching method often have a shape with large surface openings and small internal openings. , the result of this is that the processed workpiece feels bad to the touch, and it also affects the visual effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etching method
  • Etching method
  • Etching method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] A kind of etching method, comprises the following steps:

[0030] (1) Mask the workpiece: apply several corrosion-resistant adhesives on the surface of the workpiece. The corrosion-resistant adhesive is a square structure with a thickness of 10 μm, and there is an uncoated corrosion-resistant adhesive between two adjacent corrosion-resistant adhesives. The glue gap, the width of the gap is 1 / 4 of the side length of the square corrosion-resistant glue;

[0031] (2) Put the masked workpiece into the etching machine for initial etching. The pressure of the etching solution a sprayed from the nozzle of the etching machine is 1.8 psi, and the etching time is 3 minutes. The etching solution a contains FeCl 3 , water and NaCl, and FeCl 3 , the mass ratio of water and NaCl is FeCl 3 : Water: NaCl=5:35:1;

[0032] (3) Remove the film from the workpiece after the initial etching: put the workpiece after the initial etching in NaOH solution, and remove the corrosion-resistant g...

Embodiment 2

[0037] A kind of etching method, comprises the following steps:

[0038] (1) Masking the workpiece: coating a number of corrosion-resistant adhesives on the surface of the workpiece. The corrosion-resistant adhesive is a square structure with a thickness of 40 μm, and there is an uncoated corrosion-resistant adhesive between two adjacent corrosion-resistant adhesives. The glue gap, the width of the gap is 1 / 3 of the side length of the square corrosion-resistant glue;

[0039] (2) Put the masked workpiece into the etching machine for initial etching, the pressure of the etching solution a sprayed from the nozzle of the etching machine is 0.3psi, and the etching time is 10min, wherein the etching solution a contains FeCl 3 , water and NaCl, and FeCl 3 , the mass ratio of water and NaCl is FeCl 3 : Water: NaCl=35:35:1;

[0040] (3) Remove the film from the workpiece after the initial etching: put the workpiece after the initial etching in the KOH solution, and remove the corro...

Embodiment 3

[0045] A kind of etching method, comprises the following steps:

[0046] (1) Masking the workpiece: coating a number of corrosion-resistant glue on the surface of the workpiece. The corrosion-resistant glue is a square structure with a thickness of 20 μm, and there is an uncoated corrosion-resistant glue between two adjacent corrosion-resistant glues. The gap of the glue, the width of the gap is 3 / 10 of the side length of the square corrosion-resistant glue;

[0047] (2) Put the masked workpiece into the etching machine for initial etching, the pressure of the etching solution a sprayed from the nozzle of the etching machine is 0.6psi, and the etching time is 8min, wherein the etching solution a contains FeCl 3 , water and NaCl, and FeCl 3 , the mass ratio of water and NaCl is FeCl 3 : Water: NaCl=15:35:1;

[0048] (3) Remove the film from the workpiece after the initial etching: put the workpiece after the initial etching in NaOH solution, and remove the corrosion-resistan...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses an etching method. The etching method comprises the following steps of: firstly carrying out primary etching on a work piece subjected to mask treatment to basically form a convex-concave pattern with a trapezidal cross section, carrying out mold release on the work piece subjected to the primary etching, carrying out secondary etching on the resulting work piece to remove edges and edge corners, soaking the work piece in a static etching solution to further shape the work piece, and at last processing a conical array microstructure with smooth transition effect and a convex-concave cross section on the surface of the work piece. The method disclosed by the invention can be applied to all products which can be in injection molding by a mold, such as a computer, a cell phone, an electronic product, an automotive interior, and an glasses frame, not only beautiful appearance is enhanced to bring richness and diversity to vision of people, but also anti-skid effect is provided.

Description

technical field [0001] The invention relates to the field of chemical etching processing, in particular to an etching method for forming an array microstructure with a smooth transition effect and a convex-concave cross-section on the surface of metal products such as stainless steel or mold steel. Background technique [0002] In the field of mold and metal product manufacturing, processing a micron-scale array of micro-convex or micro-concave structures on the surface of molds and products can increase the aesthetics, anti-slip effect, and cleaning effect of the product. Compared with mechanical micro-milling, micro-turning, laser processing, EDM and electrochemical processing, chemical etching is preferred because of its simple processing method, good rapid prototyping effect, significant reduction in production costs, and low requirements for equipment. widely used. [0003] The principle of the chemical etching method is to use the chemical reaction between the metal a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/02
Inventor 郭钟宁黄红光宋卿张永俊唐勇军王冠
Owner GUANGDONG UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products