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A Method for Measuring Compensation Effect of Mirror Shape

A compensation effect, mirror surface technology, applied in measuring devices, photoengraving process of pattern surface, originals used for optomechanical processing, etc. Simple, avoids the effect of unnecessary error terms

Active Publication Date: 2015-09-30
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Existing technologies usually use exposure to analyze the mirror shape compensation effect, but there are many error items in the exposure results, and the analysis is more complicated

Method used

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  • A Method for Measuring Compensation Effect of Mirror Shape
  • A Method for Measuring Compensation Effect of Mirror Shape
  • A Method for Measuring Compensation Effect of Mirror Shape

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Experimental program
Comparison scheme
Effect test

specific Embodiment 1

[0027] see figure 1 As shown, the lithography machine used in the present invention includes an illumination system 1 , a mask table 3 carrying a mask 2 , a projection objective lens 4 for mask imaging, and a substrate table 6 carrying a substrate 5 . A first strip mirror 8 is attached to the side of the mask table 3, a second strip mirror 10 is attached to the side of the substrate table 6, the first interferometer 7 controls the movement of the mask table 3, and the second interferometer 9 controls the substrate table 6 moves, and the mask alignment system 11 and the substrate alignment system 12 are located on the substrate table 6 . The first interferometer control system 7 makes the interferometer beam reflected by the strip mirror 8 to control the horizontal (x, y, Rz) and vertical (z, Rx, Ry) movements of the mask table 3, and the second The interferometer control system 9 makes the interferometer beam reflected by the strip mirror 10 to control the horizontal (x, y, R...

specific Embodiment 2

[0033] The structure of the lithography machine system used in this embodiment is the same as that of Embodiment 1. This embodiment can verify the X-direction mirror shape compensation effect on the substrate table. The specific implementation steps are as follows:

[0034] 1) Upload the substrate with a test mark such as Figure 5 As shown, the test mark includes several sub-marks, the sub-marks are arranged in a row along the X direction on the substrate, the position Y of the sub-marks is the same, and the interval between the sub-marks is preferably 1 mm. The type of sub-marks is the same as the alignment mark of the substrate alignment system 11 match;

[0035] 2) The second interferometer 9 controls the movement of the substrate table 6 along the X direction (preferably Y=0), so that each sub-mark of the test mark on the substrate is respectively located under the optical axis of the substrate alignment system, and the substrate alignment system 12 performs alignment res...

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Abstract

The invention relates to a method for measuring mirror surface shape compensation effect. A lithography machine applying the method comprises an illumination system, a mask stage bearing a mask, a projection object lens imaging system, a substrate stage used for bearing a substrate, a mask stage interferometer system, and a mask aligning system. A long-bar mirror is adhered to the mask stage. Interferometer light beam is reflected through the long-bar mirror, and mask stage movement is controlled. The method comprises the steps that: a mask with a testing mark is loaded, wherein the testing mark comprises a plurality of sub-marks which are arranged in a row; the mask stage interferometer system controls the mask stage to move along the arrangement direction of the plurality of sub-markers; alignment measurement is carried out by using the mask aligning system, and the alignment positions of the plurality of sub-markers are obtained; the testing mark matches the alignment marker of the mask alignment system; according to the alignment positions, surface shape residual error measurement value is obtained; and it is determined that whether the mirror surface shape compensation effect of the long-bar mirror along the arrangement direction reaches the requirement. The measuring method is fast and accurate, and has the advantage of simple steps. With the method, the introduction of unnecessary error terms in exposure analysis can be avoided.

Description

technical field [0001] The invention relates to the field of surface shape measurement, in particular to a method for measuring the compensation effect of mirror surface shape. Background technique [0002] In the existing lithography equipment, although the strip mirror installed on the side of the mask table or the substrate table has been precisely machined and polished, defects still inevitably exist on its surface. Even a defect point with a size of a few nanometers will cause a considerable error in the accuracy of the lithography machine system. In order to reduce the above errors as much as possible, it is necessary to scan and test the surface of the strip mirror before exposure to obtain the measurement data of its surface shape image, and then correct and compensate the surface defects to meet the high precision requirements of the system. [0003] The patent US05790253 uses an interferometer to control the horizontal position to measure the shape of the long mir...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/42G03F1/44G03F7/20G01B11/24
Inventor 李煜芝李术新孙刚
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD