Air extractor, low-pressure chemical vapor deposition equipment and chemical vapor deposition method
A low-pressure chemical vapor phase and chemical vapor deposition technology, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve serious and particle pollution problems, improve the particle condition, ensure the quality of film formation, reduce The effect of wet cleaning times
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[0043] In order to make the above objects, features and advantages of the present invention more obvious and comprehensible, specific embodiments of the invention will be described in detail below in conjunction with the accompanying drawings.
[0044] The device and equipment of the present invention can be widely used in various fields, and can be made of various suitable materials, which will be described below through specific examples. Of course, the present invention is not limited to this specific example. Common replacements known to those skilled in the art are undoubtedly included within the protection scope of the present invention.
[0045] Secondly, the present invention is described in detail using schematic diagrams. When describing the embodiments of the present invention in detail, for the convenience of explanation, the structural proportions in the schematic diagrams are only schematic and should not be taken as limitations of the present invention.
[0046]...
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