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Automatic focusing method of photoetching machine

An automatic focusing and lithography machine technology, applied in microlithography exposure equipment, optics, optical components, etc., can solve problems such as poor anti-interference ability and wrong focus, and achieve strong anti-interference ability, high precision, and calculation speed fast effect

Inactive Publication Date: 2013-08-21
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology

[0005] The present invention provides an automatic focusing method for a lithography machine in order to solve the problems of poor anti-interference ability and easy to cause wrong focusing of the existing automatic focusing method

Method used

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  • Automatic focusing method of photoetching machine
  • Automatic focusing method of photoetching machine
  • Automatic focusing method of photoetching machine

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specific Embodiment approach 1

[0026] Specific implementation mode 1. Combination figure 1 and figure 2 To illustrate this embodiment, the automatic focusing method of a lithography machine described in this embodiment mainly includes two parts: the first part is the calculation method of the average focusing evaluation function of the image, and the second part is the automatic focusing mechanism of the focusing mechanism. The operation method, the specific steps are:

[0027] Step 1, the CCD camera collects image information, and transmits the collected image information to the computer;

[0028] Step 2. The computer receives the image information and calculates the average focusing evaluation function F of the image at the current position navg , the n is a positive integer, and n is greater than or equal to 2;

[0029] Step A. The computer divides the collected image into blocks, finds the maximum gray value and the minimum gray value in each sub-block, and obtains the maximum gradient square value ...

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Abstract

The invention discloses an automatic focusing method of a photoetching machine, which relates to a calculating method of average focusing evaluation functions including images and an automatic running method of a focusing mechanism. The calculating method of the average focusing evaluation functions comprises the following steps of: moving subblocks horizontally at the variable step size in a blocking mode mainly; increasing the horizontal moving step size in rough focusing; and decreasing the horizontal moving step size in fine focusing, thereby obtaining the final average focusing evaluation functions by a multiple smoothing method of continuous multi-frame images. The automatic running method of the focusing mechanism comprises the following steps of: comparing the average focusing evaluation function in the current position with the average focusing evaluation functions of two previous step sizes by an improved hill climbing method, and determining the forward running or backward running of the focusing mechanism according to the compared result; and then determining whether the focusing is finished according to the relationship between the focusing step size and the required focusing accuracy. The method provided by the invention has the characteristics of high arithmetic speed, high flexibility, high precision, high anti-interference capability and good stability.

Description

technical field [0001] The invention relates to the fields of automatic focusing of photolithography machines and digital image processing, in particular to an automatic focusing method of photolithography machines. Background technique [0002] With the rapid development of modern high-precision machining equipment, the development space and importance of lithography machine technology are also increasing. With the advancement of science and technology and the pursuit of higher and finer technology by human beings, it has experienced from contact lithography machine, proximity lithography machine, full silicon wafer scanning projection lithography machine, distributed and repeated projection lithography machine to the present The development history of the commonly used step-and-scan projection lithography machine. The progress of each stage is towards the goal of fast marking speed, high precision, short time consumption, low cost and high stability. Among them, the scor...

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Application Information

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IPC IPC(8): G03F7/20G02B7/36
Inventor 韩希珍赵建孙强
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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