Unlock instant, AI-driven research and patent intelligence for your innovation.

Film exposure apparatus and film exposure method

An exposure method and thin film technology, which are applied in the direction of photolithography exposure device, printing device, microlithography exposure equipment, etc., can solve the problems of easy film flapping and exposure position deviation, etc., to achieve stable exposure and easy formation Effect

Inactive Publication Date: 2017-02-15
V TECH CO LTD
View PDF11 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] When exposing a film with such an exposure device, vibrations are likely to occur during conveyance of the film, and thus, there is a problem of shifting the exposure position.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Film exposure apparatus and film exposure method
  • Film exposure apparatus and film exposure method
  • Film exposure apparatus and film exposure method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] Hereinafter, embodiments of the present invention will be specifically described with reference to the attached drawings. First, the structure of the exposure apparatus concerning the thin film concerning embodiment of this invention is demonstrated. figure 1 It is a figure which shows the correction|amendment of the deviation of the width direction of the film by the alignment mark in the exposure apparatus of the film concerning embodiment of this invention, figure 2 It is a figure which shows the exposure process by the mask on the downstream side in the exposure apparatus of the thin film concerning embodiment of this invention. An exposure apparatus 1 for a film according to this embodiment includes an exposure light source 11 for emitting exposure light, a mask 12, an optical system for irradiating the film 2 with the exposure light emitted from the exposure light source 11 through the mask 12, and a conveyor for conveying the film 2 . The film conveyance secti...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
wavelengthaaaaaaaaaa
Login to View More

Abstract

In the present invention, a laterally situated exposure material membrane is formed in one or both of film base material feeding areas which are on both sides of the cross-wise direction of a film base material (20). An alignment mark forming area (14) forms an alignment mark (2a) by irradiation of exposure light. This alignment mark (2a) is used to detect meandering of the film and to adjust the position of a mask (12). Thus, this film exposure device and film exposure method, capable of easily forming the alignment mark during continuous exposure of film, of correcting film meandering with a high degree of precision, and of exposing film with stability, are obtained.

Description

technical field [0001] The present invention relates to a film exposure device and a film exposure method, and more particularly, to a film exposure device and a film exposure method capable of correcting the meandering of a film with high precision and stably exposing a film during continuous exposure. Background technique [0002] Conventionally, for example, when exposing a component such as a flat substrate, in order to manage the exposure position with high precision, for example, a substrate with a predetermined mark on the surface is used, and the mask used for exposure is determined by the mark. The position of the die (for example, Patent Documents 1 to 3), or a pin (pin) for positioning with a tray on which the substrate is provided (for example, Patent Document 4). [0003] However, in the case where a film to be exposed is continuously supplied into the exposure apparatus as in the roll troll method, it is difficult to apply the alignment technique in the exposur...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F9/00G03F7/20H01L21/677H01L21/68
CPCG03B17/24G03B27/53G03B27/58G03F7/2002G03F7/70791G03F9/00H01L21/67259H01L21/67276H01L21/681
Inventor 水村通伸
Owner V TECH CO LTD