Self-cleaning structure and manufacturing method thereof

A self-cleaning, structural layer technology, applied in the field of material processing, can solve problems that affect product quality and life, and cannot guarantee the fixing effect of nanoparticles, so as to achieve the effect of ensuring quality and life and increasing self-cleaning effect

Inactive Publication Date: 2015-06-17
XI'AN UNIVERSITY OF ARCHITECTURE AND TECHNOLOGY
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Most of the existing anti-pollution and self-cleaning materials achieve their self-cleaning effect by immobilizing photocatalytic or highly hydrophilic nanoparticles, but the existing technology cannot guarantee the immobilization effect of nanoparticles, which affects the quality and quality of products. life

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-cleaning structure and manufacturing method thereof
  • Self-cleaning structure and manufacturing method thereof
  • Self-cleaning structure and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] see figure 1 As mentioned above, the self-cleaning structure of the present invention includes a substrate 1 on which a patterned structural layer 2 is formed, and a layer of hydrophobic coating 3 is coated on the patterned structural layer 2 . The substrate 1 can be a glass substrate, a ceramic substrate, a metal substrate, a plastic substrate or a glazed substrate, or an enamel substrate; the hydrophobic coating 3 can be a fluorosilane coating, and the thickness of the hydrophobic coating 3 is less than or equal to 100nm . The patterned structural layer 2 is a matrix of protrusions formed on the surface of the substrate 1, the protrusions are triangular prisms, quadrangular prisms, polygonal prisms, cylinders, elliptical prisms, hemispheres or frustums, and the height of the protrusions is greater than or equal to 500nm.

[0042] The manufacturing method of the self-cleaning structure of the present invention comprises the following steps:

[0043] (1) Apply a liqui...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
heightaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a self-cleaning structure and a manufacturing method thereof. The self-cleaning structure comprises a base material, wherein a graphical structural layer is formed on the base material, and the graphical structural layer is coated with a hydrophobic coating; the graphical structural layer is a bulged matrix formed on the surface of the base material, and the height of bulge is greater than or equal to 500nm; the thickness of the hydrophobic coating is less than or equal to 100 nm; and the base material is made of glass, ceramic, metal, plastic, glaze or enamel. According to the self-cleaning structure, the graphical structural layer on the surface of the base material is integrated with the base material and cannot fall off, so that the quality and the service life of a product are effectively guaranteed; and the graphical structural layer is coated with the hydrophobic coating, so that the self-cleaning effect of the self-cleaning structure disclosed by the invention is enhanced.

Description

【Technical field】 [0001] The invention belongs to the technical field of material processing, and in particular relates to a self-cleaning structure and a manufacturing method thereof. 【Background technique】 [0002] Self-cleaning and self-cleaning materials with high efficiency and anti-pollution have attracted much attention. Most of the existing anti-pollution and self-cleaning materials achieve their self-cleaning effect by immobilizing photocatalytic or highly hydrophilic nanoparticles, but the existing technology cannot guarantee the immobilization effect of nanoparticles, which affects the quality and quality of products. life. 【Content of invention】 [0003] The purpose of the present invention is to provide a self-cleaning structure with simple structure and convenient manufacture and its manufacturing method on the surface of the substrate; it can be used on the surface structure of glass, ceramics, metal, plastic substrates or glazed, enamel and other substrate...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): B32B33/00B82Y30/00G03F7/00
Inventor 叶向东蔡安江惠旭升
Owner XI'AN UNIVERSITY OF ARCHITECTURE AND TECHNOLOGY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products