Two-dimensional irregular layout method based on multi-subpopulation particle swarm optimization

A particle swarm algorithm and multi-subgroup technology, applied in the field of nesting, can solve problems such as easy to fall into local extremum, difficult to jump out, poor local search ability, etc., to achieve good search ability, good nesting effect, and fast search speed Effect

Active Publication Date: 2013-10-02
ZHEJIANG UNIV OF TECH
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Problems solved by technology

In practice, because the simulated annealing algorithm is affected by the annealing speed, the speed is fast, it is easy to fall into the local extremum, and the speed is slow, it is difficult to meet people's needs;

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  • Two-dimensional irregular layout method based on multi-subpopulation particle swarm optimization
  • Two-dimensional irregular layout method based on multi-subpopulation particle swarm optimization
  • Two-dimensional irregular layout method based on multi-subpopulation particle swarm optimization

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Embodiment Construction

[0042] The present invention will be further described below in conjunction with the accompanying drawings.

[0043] refer to Figure 1 ~ Figure 3 , a two-dimensional irregular layout method based on the multi-subgroup particle swarm optimization algorithm, including the following steps:

[0044] The first step is the selection of the underlying algorithm for two-dimensional irregular layout

[0045] For the typesetting of two-dimensional irregular samples, it is first necessary to determine the outline of the samples in order to judge whether the samples will overlap during the sample input process. The present invention chooses to convert the geometric figures of the samples and materials into a series of two-dimensional coordinate intervals , so as to break away from the complexity of irregular geometric figures for nesting, and then use the heuristic bottom-left search algorithm (HBLS) to judge whether the two-dimensional interval of the sample and the material overlaps t...

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Abstract

A two-dimensional irregular layout method based on an improved particle swarm algorithm comprises the following steps of: converting geometric figures of a sample wafer and a material into a train of two-dimensional coordinate intervals, judging whether the two-dimensional intervals of the sample wafer and the material are overlapped with a heuristic bottom-left searching algorithm to move the position of the sample wafer relative to the material, and executing an improved PSO (Particle Swarm Optimization) searching process. According to the method of dividing multiple subpopulations, the influence of subpopulation optimal solutions on particles in the subpopulations is added under the condition of not changing a parameter trending to the current optimal solution, when the iteration time of a particle swarm reaches the initially set maximum iteration time, the particles stop iteration, and the current globally optimal solution is obtained as the final layout scheme. The two-dimensional irregular layout method based on the improved particle swarm algorithm has good searching capability, and is high in searching speed, good in final solution and good in layout effect.

Description

technical field [0001] The invention relates to computer-aided nesting technology, in particular to a nesting method. Background technique [0002] At present, domestic and foreign layout methods for irregular parts are basically concentrated in heuristic modern optimization methods, mainly including simulated annealing algorithm, genetic algorithm, particle swarm algorithm (PSO) and so on. In practice, because the simulated annealing algorithm is affected by the annealing speed, the speed is fast, it is easy to fall into the local extremum, and the speed is slow, it is difficult to meet people's needs; the genetic algorithm is often "premature" and has poor local search ability. ; The PSO algorithm has a strong local search ability, but it is also easy to fall into the extreme value area and it is difficult to jump out. [0003] Nesting problems have a wide range of applications, such as sheet metal layout, glass tailoring, clothing tailoring, etc. Due to the large product...

Claims

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Application Information

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IPC IPC(8): G06F17/50G06N3/00
Inventor 董辉黄胜黄文嘉俞立高阳吴祥罗立锋仲晓帆
Owner ZHEJIANG UNIV OF TECH
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