A mask table for exposure device

Abstract

The invention discloses a mask stage for an exposure device. The mask stage comprises a mechanical pre-alignment table and a driving mechanism, wherein the mechanical pre-alignment table comprises a bearing table, an X-direction pre-alignment mechanism and a Y-direction pre-alignment mechanism; the bearing table is used for fixing at least two masks of different sizes; the X-direction pre-alignment mechanism is used for realizing X-direction pre-alignment of the masks of different sizes; the Y-direction pre-alignment mechanism is used for realizing Y-direction pre-alignment of the masks of different sizes; the driving mechanism comprises a Y-direction coarse motion motor and an X-direction micro motion motor; the Y-direction coarse motion motor drives the mechanical pre-alignment table to perform scanning movement along the direction Y so as to perform large-travel scanning; the X-direction micro motion motor drives the mechanical pre-alignment table to move along the direction X so as to realize fine adjustment of the X / Rz direction. The driving mechanism has a single-layer driving structure, the structural design complexity of the mask stage in a small-object distance exposure device is reduced, and a compatible function of large and small masks is realized through the mechanical pre-alignment table; moreover, according to the driving mechanism, a traditional mechanical guide structure is omitted, and the mask stage structure is effectively simplified.

Description

technical field [0001] The invention relates to a mask table, in particular to a mask table used in a large field of view exposure device. Background technique [0002] The photolithography apparatus in the prior art is mainly used in the manufacture of integrated circuits (ICs) or flat panel displays and other micro devices. With a photolithographic apparatus, multilayer masks with different mask patterns are sequentially imaged in precise alignment on a photoresist-coated wafer, such as a semiconductor wafer or an LCD panel. Lithography devices are generally divided into two categories, one is a stepping lithography device, the mask pattern is exposed and imaged on one exposure area of ​​the wafer, and then the wafer moves relative to the mask to move the next exposure area to the mask pattern and under the projection objective, the mask pattern is again exposed on another exposed area of ​​the wafer, and the process is repeated until all exposed areas on the wafer have a...

AI Technical Summary

Problems solved by technology

However, since the micro-motion stage is arranged on the coarse motion stage, the requirements for the distance between the objective lens and the object lens are very large, so it is difficult to apply to the field of splicing lens flat panel display lithography machine

Images