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Arc detection and inhibition method for magnetron sputtering process

A magnetron sputtering and arc detection technology, applied in the field of surface engineering, can solve the problems of insufficient adaptability and large limitations of detection methods, and achieve the effect of making up for low efficiency

Inactive Publication Date: 2014-05-07
XIAN UNIV OF TECH
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Problems solved by technology

[0009] The purpose of the present invention is to provide an arc detection and suppression method for the magnetron sputtering process, which solves the problems of large limitations and insufficient adaptability of each detection method under the existing technical conditions

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  • Arc detection and inhibition method for magnetron sputtering process
  • Arc detection and inhibition method for magnetron sputtering process
  • Arc detection and inhibition method for magnetron sputtering process

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Embodiment Construction

[0017] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0018] like figure 1 As shown, the arc detection and suppression method for the magnetron sputtering process of the present invention includes two major steps of detection and suppression of the arc, which are implemented according to the following steps:

[0019] Step 1: The load voltage and load current of the magnetron sputtering power supply are sampled by the voltage Hall sensor and the current Hall sensor, and the voltage and current common change threshold detection method is used as the basis for arc detection judgment. If it is determined that there is no arc, the current current is maintained. state; when an arc is detected, enter step 2 for arc extinguishing processing;

[0020] Among them, the threshold value detection method of common change of voltage and current is implemented according to the following steps: the output curre...

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Abstract

The invention discloses an arc detection and inhibition method for a magnetron sputtering process. The operation of sampling magnetron sputtering power load voltage and load current is implemented by virtue of a voltage Hall sensor and a current Hall sensor, a voltage and current common change threshold detection method serves as an arc detection judgment basis, and if the arc does not exist, the current state is maintained; when the arc is detected, inhibition is immediately performed by reducing the output voltage amplitude; when arcs which exceed a set number are generated through accumulation, a target (namely a cathode) is cleaned in a forced mode. According to the method, the arcs can be reliably, efficiently and comprehensively detected, and losses in process intervals can be reduced as much as possible, so that the efficiency of the magnetron sputtering coating process and the quality of the coating are improved.

Description

technical field [0001] The invention belongs to the technical field of surface engineering and relates to an arc detection and suppression method used in a magnetron sputtering process. Background technique [0002] As a deposition coating method, magnetron sputtering technology is widely used in industrial production and scientific research fields, such as microelectronics, optical thin film and material surface treatment. During the sputtering process, due to the large-scale continuous changes in the load and the environment, there are high requirements for the output performance of the power supply. Whether the stability and reliability of the power supply device can adapt to the above changes and provide good sputtering conditions will seriously affect the thin film. the quality of. [0003] Especially during the sputtering process, due to the accumulation of charges on the cathode, an arc is inevitably formed between the target (ie "cathode") and the anode. If the form...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/54
Inventor 孙强宁波陈桂涛黄西平孙向东
Owner XIAN UNIV OF TECH
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