Etchant composition, method for forming metal pattern, and method for manufacturing array substrate
A composition and etchant technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., and can solve problems such as damage to lower data lines
Active Publication Date: 2018-03-13
DONGWOO FINE CHEM CO LTD
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- Abstract
- Description
- Claims
- Application Information
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Problems solved by technology
However, the etchant composition has a problem in that although the composition etches the silver of the transparent electrode / silver / transparent electrode film assembly and prevents its transparent electrode film from being corroded, the phosphoric acid contained in the composition damages the lower data line (lower data line)
Method used
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preparation example Construction
[0054] Preparation of etchant composition
[0055] An etchant composition weighing 10 kg was prepared using the composition ratios given in Table 1 below.
[0056] [Table 1]
[0057] (wt%)
HNO 3
h 2 SO 4
SPS
NHP
PDCA
water
Example 1
10.0
7.0
15
2.0
0.5
65.5
Example 2
7.0
4.5
12.0
0.5
0.1
76.4
Example 3
13.0
10.0
17.0
4.0
0.8
55.2
Comparative example 1
6.0
3.0
11.0
0.4
-
79.6
Comparative example 2
14.0
11.0
18.0
5.0
0.9
51.1
Comparative example 3
10.0
7.0
15
2.0
0.9
65.1
[0058] SPS: sodium persulfate
[0059] NHP: sodium hydrogen phosphate
[0060] PDCA: pyridine-2,6-dicarboxylic acid
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Abstract
The present invention discloses an etchant composition for a single-layer film of silver (Ag) or silver alloy or a multi-layer film consisting of said single-layer film and an indium oxide film, based on said etchant composition The total weight of the material, the etchant composition contains 0.1 to 0.8wt% of heterocyclic compounds with carboxyl groups, the invention also discloses a method for forming a metal pattern and a method for manufacturing an organic light-emitting display (OLED) array substrate method. The etchant composition can reduce the etching rate of a silver (Ag) or silver alloy single-layer film and a multilayer film composed of the single-layer film and an indium oxide film, and can exhibit uniform etching characteristics Without damaging the lower data line and without generating residue.
Description
[0001] Cross References to Related Applications [0002] This application claims the benefit of Korean Patent Application No. 10-2012-0158364 filed on December 31, 2012, which is hereby incorporated by reference in its entirety into this application. technical field [0003] The present invention relates to an etchant composition for a single-layer film of silver (Ag) or silver alloy or a multi-layer film consisting of the single-layer film and an indium oxide film, an etchant composition using the etchant composition A method for forming a metal pattern with an etchant composition and a method for manufacturing an array substrate for an organic light emitting diode (OLED) using the etchant composition. Background technique [0004] An organic light emitting diode includes two opposing electrodes and an organic multilayer thin film having semiconductor properties and disposed between the two opposing electrodes. The organic light-emitting diode uses an organic light-emittin...
Claims
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IPC IPC(8): C23F1/30H01L21/77H01L21/28H01L23/50
CPCC09K13/04C23F1/30C23F1/44H10K71/60
Inventor 张尚勋沈庆辅
Owner DONGWOO FINE CHEM CO LTD