Heavy Duty Flexible Support Device

Abstract

The invention discloses a flexible heavy load support device which comprises three flexible mechanisms, wherein the three flexible mechanisms support an objective lens and are arranged on a main substrate in an isosceles triangle manner; each flexible mechanism comprises a top cross beam and two side vertical beams; the two ends of each top cross beam are connected with every two side vertical beams arranged symmetrically; at least one first flexible hinge with a central axis in a Y direction and at least one second flexible hinge with a central axis in a Z direction are arranged on each top cross beam; the first flexible hinges are close to the centers of the top cross beams; the second flexible hinges are close to the side vertical beams; at least one third flexible hinge with a central axis in an X direction is arranged on each side vertical beam; and the first flexible hinges, the second flexible hinges and the third flexible hinges are jointly called as flexible hinges. The objective lens is supported on the main substrate by the three same flexible mechanisms, so that the whole first six-order modal frequency is less than 30Hz, vibration and isolation effects are exerted, the exposure stability of the objective lens is improved, and a short-term imaging error caused by structural vibration is reduced.

Description

technical field [0001] The invention relates to the field of photolithography machines, in particular to a heavy-duty flexible support device. Background technique [0002] During the working process of the lithography machine, the workpiece table and the mask table are respectively based on the two sides and one axis (object plane, focal plane and optical axis) of the projection objective lens. Driven by the control system, the workpiece table and the mask table are realized according to the required precision. The relative position between the mold tables and the position of the two relative to the objective lens. Since the lithography machine has the characteristics of high positioning accuracy and high synchronous motion accuracy, any external vibration and internal vibration interference will cause a short-term misalignment between the two or the relative position of the objective lens, which will seriously affect the photolithography. Engraved quality. The main facto...

AI Technical Summary

Problems solved by technology

[0004] Because the flexible mechanism 5 needs to withstand a heavy load of more than 2000N in the vertical direction, it is easy to generate stress concentration. If the structural design of the flexible mechanism 5 is unreasonable and the stress is greater than the allowable stress of the material, the flexible mechanism 5 will be damaged; even if the stress is less than the material Allowable stress, large stress acting on the flexible mechanism 5 for a long time will also cause fatigue of the flexible mechanism 5 and shorten its service life

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