ITO coating process for preventing membrane surface from discharging

Abstract

The invention discloses an ITO coating process for preventing a membrane surface from discharging. The process comprises the following steps: firstly, cleaning a target surface, a vacuum chamber and a substrate; then putting the cleaned substrate on the preset position, detecting the distance between the substrate and a target, thus obtaining a first distance value; and finally judging whether the first distance value is greater than the first preset distance value or not, if so, carrying out coating operation, if not, carrying out warning operation. The ITO coating process is reasonable in design, the distance between the substrate and the target is reasonably controlled, the gas composition content in the vacuum chamber is effectively controlled, the cleaning effect on the target surface, the vacuum chamber and the substrate is relatively good, discharge of the membrane surface is reduced, and the product achieves the technical effects of technological requirements.

Description

technical field [0001] The invention relates to the field of industrial processing and manufacturing, in particular to an ITO coating process for preventing discharge on the film surface. Background technique [0002] In the process of touch screen production and manufacturing, ITO glass is required, and coating of ITO glass is a key process in the manufacturing process. The success or failure of coating is related to the quality of ITO glass. [0003] In the prior art, the staff did not clean the target surface, the vacuum chamber, and the substrate before coating, resulting in more impurities, and prone to tip discharge phenomenon, which in turn easily caused discharge on the film surface. In the prior art, When the staff placed the substrate, they did not control the distance between the substrate and the target, which caused the substrate to be too close to the target, which easily caused discharge on the membrane surface, and in the prior art, there was too much reactio...

AI Technical Summary

Problems solved by technology

[0006] The invention provides an ITO coating process for preventing discharge on the film surface, which solves the problem of unreasonable control of the distance between the substrate and the target in the ITO coating process of the prior art, and the inability to effectively control the gas content in the vacuum chamber. No effective cleaning was carried out before, resulting in the discharge of the film surface, and the technical problems that the product did not meet the process requirements. The design of the ITO coating process was reasonable, the distance between the substrate and the target was reasonably controlled, and the gas in the vacuum chamber was controlled. The composition content is effectively controlled, the cleaning effect of the target surface, vacuum chamber and substrate is better, the discharge of the film surface is reduced, and the product meets the technical effect required by the process

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