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97results about How to "Avoid tip discharge" patented technology

Diode chip and processing technology thereof

The invention provides a diode chip and a processing technology thereof, relating to a semiconductor discrete device and a processing technology thereof. The invention can overcome discharge in detection and creepage phenomenon in use. A circle of glassy protective layer is arranged at the edge of a chip, the horizontal projection of the chip is of a closed shape with no corner; the side edge is provided with a circle of semi-insulating polycrystalline silicon (SIPOS) film; and the glassy protective layer covers 70-95% of the upper part of the SIPOS film. The processing technology provided bythe invention comprises the following steps: 1) graving a wafer split pattern; 2) passivating the SIPOS film; 3) processing the glassy protective layer; 4) photoengraving three times; 5) cleaning; 6)removing photoresist; 7) splitting to obtain the chip. By the adoption of the invention, the point discharge of a square chip can be effectively prevented and the withstand voltage capacity of a diode can be improved. Before passivation with glass, passivation with an SIPOS film is carried out to absorb movable ions on the surface of the chip, thus the stability can be enhanced and the withstand voltage capacity can be improved; meanwhile, the bottoms of grooves still remains the SIPOS film and an SIO2 film, thus preventing Au layer adhesion in Au evaporation.
Owner:扬州杰利半导体有限公司

Method for improving performance of fin field-effect transistor

A method for improving performance of a fin field-effect transistor comprises the steps of providing a substrate, wherein fin parts are arranged on a surface of the substrate, isolation layers are also arranged on the surface of the substrate and cover surfaces of a part of side walls of the fin parts, and the fin part higher than top parts of the isolation layers comprises a first fin part and a second fin part; performing non-crystallization ion injection on the first fin part and the second fin part, forming a first non-crystallization layer on a surface of a side wall of the first fin part, and forming a second non-crystallization layer on the surface of the top part and the surface of the side wall of the second fin part, wherein the thickness of the second non-crystallization layer is larger than the thickness of the first non-crystallization layer; and oxidizing the first fin part and the second fin part, and forming oxide layers on the surface of the top part and the surface of the side wall of the second fin part and the surface of the side wall of the first fin part. By the method, the thickness uniformity of the formed oxide layers is improved, particularly, the performance of the oxide layers at corners of the top parts of the fin parts can be improved, and the reliability and the electrical property of the fin field-effect transistor are further improved.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1

Damper for 1000kV extra-high voltage alternative-current transmission line

The invention relates to a damper for 1000kV extra-high voltage alternative-current transmission lines in power sector, which comprises a cable clamp, two damper bodies, a steel strand and at least one preformed armor rod. The cable clamp and the steel strand are fixedly connected; the two damper bodies are respectively fixed on the two ends of the steel strand; the preformed armor rod fixes the cable clamp on a power transmission line; the cable clamp is in a sea horse shaped structure; the damper bodies are in a kirsite cucurbit shaped structure; and the connection position of the steel strand and the damper bodies is arranged on the sides of the fixing end damper heads of the damper bodies. Since the cable clamp is provided with a separation nail, the damper can be effectively connected with a power transmission cable; and hangers of the cable clamp, as well as corners of the cable clamp, which are used for fixing conduits, are designed in to an arc shape, thereby avoiding marginaldischarge; since the damper bodies made of kirsite are cast into a cucurbit shape, the specific gravity of the damper bodies is improved and the volume of the damper bodies is reduced; and since the connection between the windward side of the damper head at a cantilever end and the damper heads is designed into an arc shape and the size of the arc is controlled in a certain range, the marginal discharge can be avoided.
Owner:JIANGSU TIANNAN ELECTRIC POWER EQUIP

Forming method for fin-type field-effect tube

The invention discloses a forming method for a fin-type field-effect tube, and the method comprises the steps: providing a substrate which is provided with a plurality of split fin parts, wherein thefin parts are provided with first atoms; forming a pseudo-gate structure which stretches across the fin parts and covers the top surfaces and side wall surfaces of a part of fin parts, and comprises agate oxidation layer and a pseudo-gate electrode layer located on the gate oxidation layer; removing a part of the pseudo-gate electrode layer by certain thickness; carrying out the annealing processing of the tops of the fin parts through the gas comprising second atoms after the part of the pseudo-gate electrode layer is removed, wherein the second atoms can form chemical bonds with the first atoms in the annealing processing. According to the invention, after the part of the pseudo-gate electrode layer is removed, the gas comprising second atoms is employed for the annealing processing ofthe tops of the fin parts. Because the second atoms can form chemical bonds with the first atoms in the annealing processing, the annealing processing is suitable for the reduction of the semiconductor atom dangling bonds in corner regions of the tops of the fin parts (such as a silicon atom dangling bond), improves the interface state between the gate oxidation layer and the fin parts, and solvesa problem of pea discharge caused by the sharp corners of the corner regions.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1

Static contact and switch cabinet using static contact

The invention relates to a static contact and a switch cabinet using the static contact, the switch cabinet comprises the static contact, a contact box and a busbar, the static contact is installed ina static contact cavity, and the rear end surface of the static contact is conductively matched with the surface of the busbar; the contact body is provided with a built-in mounting hole which corresponds to the first connecting hole in the busbar and is provided with a fastener in a penetrating manner; the static contact further comprises a connecting lug plate with a first end and a second end,the first end is connected to the outer peripheral surface of the contact body, and the second end extends in the radial direction of the contact body relative to the first end, so that the second end of the connecting lug plate extends towards the busbar wire inlet when the static contact is mounted in the contact box; the rear side plate surface of the connecting lug plate and the rear end surface of the contact body form a conductive matching surface together, and the conductive matching surface is used for being conductively matched with the surface of the busbar; and the connecting lug plate is provided with an external mounting hole which corresponds to the second connecting hole on the busbar and is penetrated by a fastener. The technical problems that single-hole installation is easy to loosen and multi-hole installation causes high cost of the static contact are solved.
Owner:HENAN PINGGAO GENERAL ELECTRIC CO LTD +2

Semiconductor device and forming method thereof

A semiconductor device and a forming method thereof are provided. The forming method of the semiconductor device comprises the following steps: providing a substrate; forming a lamination structure covering the surface of the substrate, wherein the lamination structure includes a first stress layer disposed on the surface of the substrate, an intrinsic layer disposed on the surface of the first stress layer and a second stress layer disposed on the surface of the intrinsic layer, the lattice constant of the first stress layer is smaller than the lattice constant of the intrinsic layer, and the lattice constant of the intrinsic layer is smaller than the lattice constant of the second stress layer; forming a gate structure on the surface of the second stress layer; etching the lamination structure on the two sides of the gate structure to form grooves; and forming a third stress layer filling the grooves, wherein the lattice constant of the third stress layer is greater than the lattice constant of the first stress layer. The leakage current in the semiconductor device is reduced and the source-to-drain punch-through problem of the semiconductor device is inhibited while the carrier mobility of the semiconductor device is improved.
Owner:SEMICON MFG INT (SHANGHAI) CORP

High-voltage wire jumper windproof eccentric suspension weight device

The invention discloses a high-voltage wire jumper wire wind-deflection-prevention suspension heavy hammer device, and solves the technical problems that in the prior art, the suspension heavy hammeris inconvenient to install, poor in stability and serious in potential safety hazards. The device comprises a heavy hammer piece and a wire clamp connecting unit connected with the heavy hammer pieceand a pole tower; the heavy hammer piece is connected with the wire clamp connecting unit through a ball head and a bowl head which are matched with each other; the heavy hammer piece comprises a center rod and a heavy hammer piece assembly detachably connected to the periphery of the center rod; each heavy hammer piece comprises at least one heavy hammer piece assembly; and the heavy hammer pieceassembly is connected with a detachable pulley assembly. According to the device, transportation, installation and maintenance are facilitated, and point discharge can also be avoided; in addition, the wind resistance is small, and the effect of reliably stabilizing the wire jumper wire is achieved. The device further has the wind deflection prevention effect on the suspension stable wire and thejumper wire, so that the space safety distance between the conductor of an electrified wire and a pole tower, a stay wire and an adjacent object is guaranteed.
Owner:PUYANG POWER SUPPLY COMPANY STATE GRID HENAN ELECTRIC POWER +1

Method for forming silicon oxide side wall of gate of metal tungsten silicide

The invention discloses a method for forming a silicon oxide side wall of the gate of metal tungsten silicide. The method includes the steps that a gate structure composed of gate oxide, gate polycrystalline silicon and the metal tungsten silicide is formed, and the top of the gate structure is protected by photoresist; the RIE process of process gas including carbon tetrafluoride is utilized to conduct ashing processing on the photoresist; a silicon substrate on which the RIE process is conducted is rinsed with deionized water; the RTO process is conducted, and then the silicon oxide side wall is formed on the side wall of the gate structure. By the adoption of the method, grains of the metal tungsten silicide can be prevented from growing to form spherical protrusions when the silicon oxide side wall grows, point discharge caused by the spherical protrusions can also be avoided, and breakdown voltages of devices are increased; in addition, process cost can be reduced. According to the silicon oxide side wall formed through the method, stress between a silicon nitride layer and a gate polycrystalline silicon side wall can be reduced, and lattice defects of the gate polycrystalline silicon side wall can be repaired.
Owner:SHANGHAI HUAHONG GRACE SEMICON MFG CORP

Tubular busbar connection structure

The invention provides a tubular busbar connection structure. The tubular busbar connection structure comprises a first tubular busbar and a second tubular busbar which are telescopically assembled. One end of the first tubular busbar is arranged in the second tubular busbar. A contact extending along the axial direction of the tubular busbar is fixedly arranged in one of the tubular busbars, and a contact finger matched with the contact is fixedly arranged in the other tubular busbar. The annulus between the first tubular busbar and the second tubular busbar is provided with a limiting structure used for preventing radial swinging of the two tubular busbars. The first tubular busbar can be inserted into the second tubular busbar and can telescopically move. The contact and the contact finger which can be conducted with the tubular busbars are correspondingly arranged in the first tubular busbar and the second tubular busbar so that constant conduction can be guaranteed in telescopic movement of the two tubular busbars. Radial swinging of the first tubular busbar and the second tubular busbar can be prevented by the limiting structure so that the situation that the certain part of the contact finger is affected by excessive pressure and damaged can be prevented. The contact and the contact finger are installed in the tubular busbars without the influence of corona.
Owner:PINGGAO GRP +1

Metal-insulator-metal capacitor structure and forming method thereof

The invention provides a metal-insulator-metal capacitor structure. The metal-insulator-metal capacitor structure comprises a lower electrode, a dielectric layer, an interface layer and an upper electrode; the dielectric layer is formed on the lower electrode; the upper electrode is formed on the dielectric layer; the interface layer is formed between the dielectric layer and the upper electrode, and / or the interface layer is formed between the dielectric layer and the lower electrode; the lower electrode comprises an interconnection metal layer and a metal barrier layer, the metal barrier layer is located between the interconnection metal layer and the dielectric layer, the thickness of the metal barrier layer is larger than 400 angstroms, the roughness of the interface layer is smaller than that of the surface, facing the dielectric layer, of the metal barrier layer, and the dielectric constant of the interface layer is larger than that of the dielectric layer. According to the invention, the surface of the lower electrode is smoothed by increasing the thickness of the metal barrier layer in the lower electrode and additionally arranging the interface layer to cover the upper surface of the metal barrier layer and / or the dielectric layer, so that the breakdown voltage of the lower electrode is improved, and the capacitance value of the lower electrode is improved by utilizing that the second dielectric constant is greater than the first dielectric constant.
Owner:GUANGZHOU CANSEMI TECH INC

Securities microwave processing device based on transverse waves

ActiveCN111643695AAvoid Induced EMFRealize microwave disinfection and sterilizationLavatory sanitoryRadiationEngineeringMicrowave sterilization
The invention discloses a securities microwave processing device based on transverse waves. The securities microwave processing device based on transverse waves comprises a microwave generator moduleand a microwave work cavity, wherein the microwave work cavity comprises one or a plurality of accommodating regions; the accommodating regions are used for placing securities; each accommodating region comprises a carrying surface; the carrying surface is used for carrying the securities in a state of approximately parallel to the surface of the securities; the carrying surface is vertical to thethickness direction of the securities; the microwave generator module is used for generating microwaves, and enabling the microwaves to enter the microwave work cavity from one side or a plurality ofsides of the microwave work cavity; the microwaves are spread in a mode of transverse waves in an unmixed mode in the accommodating region; and in addition, the microwaves do not have a magnetic-field component in a direction of being vertical to the carrying surface. By using the securities microwave processing device based on transverse waves, the microwave sterilization and disinfection of thesecurities can be realized; and in addition, the surface printing characteristics and the machine read anti-counterfeiting performance of the securities cannot be damaged.
Owner:ZHONG CHAO GREAT WALL FINANCIAL EQUIP HLDGCO

Microwave disinfection and sterilization device for negotiable securities

ActiveCN111467531AAvoid tip dischargePrevent carbonization and burningLavatory sanitoryRadiationEngineeringMicrowave
The invention discloses a microwave disinfection and sterilization device for negotiable securities. The microwave disinfection and sterilization device comprises a microwave working cavity and at least one microwave generator, wherein the microwave working cavity comprises one or a plurality of negotiable securities containing areas; two sides of each negotiable securities containing area are independently provided with a first baffle plate and a second baffle plate; the first baffle plate and the second baffle plate are opposite; in addition, the first baffle plate and the second baffle plate are set to be in parallel with a bearing surface of each negotiable securities containing area; the first baffle plate and the second baffle plate are independently made of microwave non-penetratingmaterials; and an interval between the first baffle plate and the second baffle plate is not greater than the half wavelength of the microwave. Two sides of each negotiable securities containing areaare independently provided with the baffle plate made of the microwave non-penetrating materials, the interval between two layers of baffle plates and the wavelength of the microwave meet a certain proportional relation, a non-mixed-mode electromagnetic wave can be realized, and the negotiable securities can prevent from being carbonized and burnt down.
Owner:ZHONG CHAO GREAT WALL FINANCIAL EQUIP HLDGCO

Temperature monitoring system and method for high-voltage charged body with zero power consumption chip implantation and wireless network mode

The invention discloses a temperature monitoring system and method for a high-voltage charged body with a zero power consumption chip implantation and wireless network mode. The temperature monitoring system comprises a computer, a database, a zero power consumption chip sensor and a radio transceiver, wherein temperature-sensing elements of piezoelectric materials are integrated inside the zero power consumption chip sensor; the zero power consumption chip sensor, a thin-type chip, is integrated with an interdigital transducer and a semiconductor having a "seebeck effect" , and is pasted onto the surface of the high-voltage charged body with a heat transfer coating material as a medium. With a temperature sensing mode which is characterized in that the zero power consumption chip is directly implanted into the high-voltage charged body, the theoretical power consumption of the chip is zero, and thus defects of current sensing modes in the prior art are compensated; besides, with the adoption of a wireless network transmission mode, a full isolation is really realized. With the technical scheme, problems of insulation and power supply in temperature measuring of the high-voltage charged body are completely solved, and the high-voltage charged body can be monitored online in real time.
Owner:朱斌

Shielding layer structure of flame-retardant cable and production process thereof

The invention relates to a shielding layer structure of a flame-retardant cable, comprising a conductor shielding layer and an insulation shielding layer which are separately jointed with the inner and outer walls of the insulation layer of the flame-retardant cable. The shielding layer structure has the advantages that the conductor shielding layer and the insulation shielding layer are both chlorinated polyethylene rubber shielding layer, the conductor shielding layer is extrusion shielding layer, the insulation shielding layer has a combined structural style which combines extrusion shielding and woven metal / fiber together, and coextrusion continuous vulcanization molding is carried out on the conductor shielding layer, insulation layer and the insulation shielding layer. The invention also provides a production process of the shielding layer structure of the flame-retardant cable. The shielding layer structure of the invention has ingenious design, simple structure, and reliable and safe use, thus being able to change the structure of the electric field, homogenizing the electric field and lowering the isolate pollution; the shielding layer structure is applicable to the shielding layer structure of mine cables.
Owner:上海德力西集团有限公司

Method for improving the performance of fin field effect transistor

A method for improving performance of a fin field-effect transistor comprises the steps of providing a substrate, wherein fin parts are arranged on a surface of the substrate, isolation layers are also arranged on the surface of the substrate and cover surfaces of a part of side walls of the fin parts, and the fin part higher than top parts of the isolation layers comprises a first fin part and a second fin part; performing non-crystallization ion injection on the first fin part and the second fin part, forming a first non-crystallization layer on a surface of a side wall of the first fin part, and forming a second non-crystallization layer on the surface of the top part and the surface of the side wall of the second fin part, wherein the thickness of the second non-crystallization layer is larger than the thickness of the first non-crystallization layer; and oxidizing the first fin part and the second fin part, and forming oxide layers on the surface of the top part and the surface of the side wall of the second fin part and the surface of the side wall of the first fin part. By the method, the thickness uniformity of the formed oxide layers is improved, particularly, the performance of the oxide layers at corners of the top parts of the fin parts can be improved, and the reliability and the electrical property of the fin field-effect transistor are further improved.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1

Circular-arc microstrip curve plane slow wave device

The invention belongs to a circular-arc microstrip curve plane slow wave device which is assorted with a travelling wave tube in a microwave vacuum electronic technology. The circular-arc microstrip curve plane slow wave device comprises a boron nitride substrate, a semicircular microstrip curve and a metal shell, wherein the semicircular microstrip curve is fixed on the substrate and has an input end and an output end. According to the invention, because the microstrip curve the connection part of which is a smooth semicircular-arc is adopted, and boron nitride which has low dielectric constant and higher compression strength, hardness and heat conductivity factor is used as the substrate, not only the coupling impedance and the output power are improved, but also the strength and the heat dissipation of the substrate as well as the finished product ratio and the service life in the production process of the slow wave device are effectively improved. Therefore, the microstrip curve plane slow wave device can work in a frequency band above millimeter waves stably and reliability at the same time of being miniaturized and has the characteristics of good heat dissipation and high coupling impedance and output power, high performance and reliability while cooperatively used with the travelling tube working in a frequency band above millimeter waves, as well as high finished product rate and long service life in the production process of the slow wave device, and the like.
Owner:UNIV OF ELECTRONICS SCI & TECH OF CHINA

Rotor blade boss energy storage spot welding repair clamping device and clamping method

The invention relates to the field of aviation engine maintenance equipment, in particular to a rotor blade boss energy storage spot welding repair clamping device and a clamping method. The device and the method have a quick clamping and disassembling function, have a clamping force maintaining function and simultaneously ensure that the protective belt of a low-pressure compressor rotor blade boss is in good contact with a workbench during energy storage spot welding to form a stable current loop. The device comprises an upper clamping plate and a lower clamping plate, the upper clamping plate and the lower clamping plate are rotationally connected through mounting pins arranged in an upper clamping plate mounting hole and a lower clamping plate mounting hole, torsion springs are arranged outside the mounting pins in a sleeving mode, the upper clamping plate and the lower clamping plate are driven by the torsion springs to be clamped, and the upper clamping plate and the lower clamping plate are made of red copper. The device and the method have a quick clamping and disassembling function, ensure the production efficiency and shorten the production period. The device and the method are particularly suitable for the rotor blade boss energy storage spot welding repair process.
Owner:PLA NO 5719 FACTORY
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