609results about How to "Increase oxidation rate" patented technology

A general method and apparatus for treating materials at high speed comprises the steps of dissolving a relatively high concentration ozone gas in a solvent at a relatively low predetermined temperature T1 to form an ozone-solvent solution with a relatively high dissolved ozone concentration, and heating either the ozone-water solution or the material to be treated or both, the ozone-solvent solution and the material to be oxidized with a point-of-use heater to quickly increase the temperature to a predetermined higher temperature T2>T1, and applying the ozone-solvent solution to said material(s) whereby the heated ozone-water solution will have a much higher dissolved ozone concentration at said higher temperature, than could be achieved if the ozone gas was initially dissolved in water at said higher temperature.

An apparatus and method to treat fluid streams, and in particular emissions from lean-burn engines such as diesel engines, are disclosed, which use multiple catalysts chosen to remove hydrocarbons, carbon monoxide, particulate matter, and oxides of nitrogen. The apparatus and method also provide for heat exchange between the inlet and outlet exhaust streams to sustain the catalyzed reactions, by placing the catalysts in the temperature zones where their operation is enhanced, and they also allow for regeneration of a filter used to trap particulate matter in the streams.

An engine exhaust catalyst exhibits improved CO oxidation performance relative to conventional engine exhaust catalysts and includes a first supported catalyst comprising platinum and a second supported catalyst comprising palladium and gold species in close contact. The first supported catalyst may be a platinum catalyst, a platinum-palladium catalyst, or a platinum catalyst promoted with bismuth, and the second supported catalyst preferably has a palladium to gold weight ratio of about 0.85:1.0. To improve aged catalyst performance, the first and second supported catalysts are coated onto different layers, zones, or monoliths of the substrate for the engine exhaust catalyst.

A method for operating a spark-ignition engine having a three-way catalyst and a particulate filter downstream thereof, comprising: oscillating an exhaust air-fuel ratio entering the particulate filter to generate air-fuel ratio oscillations downstream of the particulate filter, while increasing exhaust temperature; when the downstream oscillations are sufficiently dissipated, enleaning the exhaust air-fuel ratio entering the particulate filter; and reducing the enleanment when an exhaust operating parameter is beyond a threshold amount.

An engine exhaust catalyst exhibits improved CO oxidation performance relative to conventional engine exhaust catalysts and includes a first supported catalyst comprising platinum and a second supported catalyst comprising palladium and gold species in close contact. The first supported catalyst may be a platinum catalyst, a platinum-palladium catalyst, or a platinum catalyst promoted with bismuth, and the second supported catalyst preferably has a palladium to gold weight ratio of about 0.85:1.0. To improve aged catalyst performance, the first and second supported catalysts are coated onto different layers, zones, or monoliths of the substrate for the engine exhaust catalyst.

The invention discloses a smoke desulfurization and denitrification integration method and a special device thereof. The method is characterized in that a wet-method process is used in one technological system to simultaneously remove sulfur dioxide and nitrogen oxide in the smoke; an ammonium method is used for desulfurization, ammonia water is also used as a desulfurizer of the sulfur dioxide and a neutralizing agent for byproduct nitric acid produced in the denitrification process; an oxidization reduction method is used for the denitrification, a desulfurization byproduct ammonium sulfite or ammonium bisulfite is used as a reducing agent, urea is used as a reducing agent, a quinine-contained hydroxyl compound is used as a catalyst, air is blown into the denitrification circulating liquid so as to provide the dissolving oxygen and the oxidant for the oxidization reaction of the nitrogen oxide; a byproduct ammonium nitrate of the denitrification reaction is placed into the desulfurization liquid so as to recycle the nitrogen ammonium; and ammonia nitrogen chemical fertilizer ammonium sulfate and ammonium nitrate are recycled, and the entire technological flow is free from discharging sulfur-contained or ammonia nitrogen-contained waste liquid out of the system. Due to the adoption of the method, the integration of the desulfurization and the denitrification can be realized, the device is miniaturized, and no waste liquid is discharged in the technological process.

The invention relates to a method for the catalytic oxidation of calcium sulfite in desulphurization ash by a dry method and a semi-dry method, which is carried out according to the following steps: (a) preparing a manganese salt solution with the concentration of 0.2-4%; (b) adding the manganese salt solution into desulphurization ash proportionally; (c) taking a hydrogen peroxide solution with the concentration of 1-10% and adding into the mixture of the manganese salt solution and the desulphurization ash proportionally; and (d) keeping the temperature of the mixture of the desulphurization ash, the manganese salt solution and the hydrogen peroxide solution and digesting for 0.5-2 hours. The invention uses manganese salt and hydrogen peroxide as a catalyst and an oxidant to oxidize the calcium sulfite in the desulphurization ash and has simple method, low implementation cost and easy realization. The invention can enhance the oxidation speed and limit of the calcium sulfite, solves the adverse effect of the instability caused by the slow oxidation of the calcium sulfite in air on the quality of an autoclaved brick and provides an approach which is easy to realize for the mass utilization of the desulphurization ash.

Contaminants such as photoresist are quickly removed from a wafer having metal features, using water, ozone and a base such as ammonium hydroxide. Processing is performed at room temperature to avoid metal corrosion. Ozone is delivered into a stream of process liquid or into the process environment or chamber. Steam may alternatively be used. A layer of liquid or vapor forms on the wafer surface. The ozone moves through the liquid layer via diffusion, entrainment, jetting/spraying or bulk transfer, and chemically reacts with the photoresist, to remove it.

The present invention is directed to the selective removal of ferric ion and/or ferric compounds from valuable metal recovery process streams.

The invention relates to the production of light-amplifying optical material. Liquid reactant is atomized into droplets using a high velocity gas. The droplets are subsequently introduced into a flame. Reactants are oxidized in the flame and condensed by forming small particles. At least a fraction of said particles is collected and fused to form optical waveguide material, which is subsequently drawn to form an optical waveguide. According to the invention, the velocity of the atomizing gas stream is in the order of the velocity of sound. The high velocity enhances atomization and increases reaction rates in the flame. The residence times are reduced to such a degree that unwanted phase transformations in the produced particles are substantially minimized. Consequently, very homogeneous material is produced. Especially, in the production of erbium-doped silica, low percentage of clustered erbium ions is achieved.

The invention belongs to wet method metallurgy field of rare earth production, especially relates to a preparation method for cerium hydroxide. The method comprises: (1) adding raw cerium material into alkali liquor with stirring for creating precipitate Ce(OH)3 ensuring that the mol ratio of OH ion and cerium ion is 0.5~4:1; (2) adding oxidizing agent with stirring under normal temperature with mol ratio of oxidizing agent and Ce(OH)3 as 0.1~4:1 for creating Ce(OH)4 or Ce(OH)3.OOH; (3) washing the Ce(OH)4 obtained in step (2), separating the solid from liquid, airing, and obtaining the cerium hydroxide product. The invention has a wide range of application. According to different purposes, cerium hydroxide products with different purities (80~99.9999%(CeO2/ª�RE2O3)) depending to the raw material.

A method of manufacturing a semiconductor device on a semiconductor substrate, includes the steps of forming a first metal film on a front surface of the semiconductor substrate; forming a second metal film on the surface of the first metal film; activating a surface of the second metal film to provide an activated surface; and forming a plated film on the activated surface by a wet plating method in a plating bath that includes a reducing agent that is oxidized during plating and that has a rate of oxidation, wherein the second metal film is a metal film mainly composed of a first substance that enhances the rate of oxidation of the reducing agent in the plating bath. Wet plating is preferably an electroless process.

The invention belongs to the technical field of uranium-molybdenum ore processing, specifically relates to a method for preprocessing wrapped uranium-molybdenum ores through oxidizing roasting, aims to overcome the shortages of prior art and further improve the leaching rate of valuable metal such as uranium, molybdenum, and the like, and provides a method for improving the leaching rate of uranium and molybdenum in wrapped uranium-molybdenum ores through an oxidizing roasting pretreatment. Through the oxidizing roasting treatment, the colloidal sulfur-molybdenum ore wrapping is destroyed, thus the oxidation of molybdenum ores in the wrapped uranium-molybdenum ores is promoted, and molybdenum becomes easier for leaching. After oxidizing roasting treatment, uranium and molybdenum can be leached out under a lower acid degree at a lower temperature, the leaching rate of uranium can reach 90% or more, the leaching rate of molybdenum can reach 80% or more, the leaching rates are improved by 5% and 30% respectively compared with the conventional method, moreover, no oxidizing agent is used during the leaching process, and the liquid and solid in leached ore slurry can be separated easily. The method has the advantages of low burning temperature, high oxidation rate of uranium and molybdenum, simple technology, little consumption of reagent, and low production cost.

The present invention relates to a method and apparatus for treating materials such as copper or copper based metal alloys, used in fabricating semiconductor devices with an ozone solvent solution and avoiding damage to metals by corrosion. The invention is also applicable to treating of materials such as copper and copper based alloys for the purpose of forming a protective layer on the exposed metal surface for protection of those copper surfaces from damage or corrosion caused by subsequent exposure to other liquid, gas, or plasma environments. This can be achieved by properly selecting the composition of the ozone solvent solution and controlling the pH and ORP of the ozone-solvent solution while avoiding the use of certain chemical constituents in the ozone solvent solution.

A trench MOSFET rectifier includes oxide layers having different thicknesses formed in different regions of the devices. The rectifying device also includes a source region of first conductivity type at a surface of each mesa region and a body region of a second conductivity type beneath each source region. The rectifying device also includes a dielectric layer lining the bottom and sidewall surfaces of the trenches, the portion of the dielectric layer on the bottom surface being thicker than the portion on the sidewall surface. A doped region underlies each of the first plurality of trenches. A polycrystalline silicon region filling each of the first plurality of trenches to form a gate region in each trench. A conductive material fills a plurality of contact trenches and forms ohmic contacts with the source region, body region, and gate region.