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Transfer method and thermal nanoimprint device

A technology of thermal nanoimprinting and flow direction, which is applied in the directions of transportation and packaging, applications, instruments, etc., and can solve problems such as oversized cooling mechanisms

Inactive Publication Date: 2015-01-07
ASAHI KASEI KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Further, there is a heating mechanism that requires a high temperature, and then an excessively large cooling mechanism becomes necessary.

Method used

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  • Transfer method and thermal nanoimprint device
  • Transfer method and thermal nanoimprint device
  • Transfer method and thermal nanoimprint device

Examples

Experimental program
Comparison scheme
Effect test

no. 1 Embodiment approach

[0201] Figure 14 It is a schematic diagram showing the thermal nanoimprinting apparatus according to the first embodiment. The thermal nanoimprinting apparatus 200 has a feed roll 202 that winds a long film for forming a fine pattern 101 . The feed roller 202 feeds out the fine pattern forming film 101 at a predetermined speed. A take-up roll 203 that winds up the film 101 for forming a fine pattern that has been sent out is provided as a pair with the feed roll 202 . The rotation speed of the take-up roller 203 and the rotation speed of the feed roller 202 can be controlled so that the delivery speed of the fine pattern forming film 101 is synchronized with the take-up speed, but in order to control the tension of the fine pattern forming film 101, a regulating roller or a torque motor can be used. or a tension control roller, etc., so the transport mechanism of the fine pattern forming film 101 can be appropriately designed according to the tension control method to be us...

no. 2 Embodiment approach

[0248] Figure 18 It is a schematic diagram showing the thermal nanoimprinting apparatus according to the second embodiment. In the following description, members having the same configuration as those of the article described in the first embodiment are denoted by the same reference numerals, and description thereof will be omitted.

[0249] Unlike the first embodiment, the thermal nanoimprinting apparatus 300 according to the second embodiment includes a cutting unit 501 .

[0250] (cutting part)

[0251] Such as Figure 18 As shown, a cutting portion 501 is provided downstream of the bonding portion 201 in the flow direction MD and upstream of the take-up roll 203 . In addition, it is preferable to provide sufficient intervals between the rotating body 102 and the cutting unit 501 or between the take-up roller 203 and the cutting unit 501 so that arbitrary components such as energy ray irradiation units can be provided side by side.

[0252] The cutting part 501 complet...

no. 3 Embodiment approach

[0269] Hereinafter, a thermal nanoimprinting apparatus according to a third embodiment will be described in more detail with reference to the drawings. The thermal nanoimprinting apparatus according to the third embodiment has a peeling unit 206 similarly to the thermal nanoimprinting apparatus 200 according to the first embodiment. Components having the same configuration as those in the above-mentioned embodiment are denoted by the same reference numerals, and description thereof will be omitted.

[0270] Figure 20 It is a schematic diagram showing the thermal nanoimprinting apparatus according to the third embodiment. The thermal nanoimprinting apparatus 600 according to the third embodiment has a feed roller 202 on which a long film for forming a fine pattern 101 is wound. The feed roller 202 feeds out the fine pattern forming film 101 at a predetermined speed. A take-up roll 203 that winds up the film 101 for forming a fine pattern that has been sent out is provided ...

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Abstract

Using a film (II) for fine pattern formation, which is provided with a cover film (10) that is provided with a nanoscale microrelief structure (11) on one surface, a second mask layer (12) that is provided within a recessed portion of the microrelief structure (11), and a first mask layer (13) that is provided so as to cover the microrelief structure (11) and the second mask layer (12), the first mask layer (13) and the second mask layer (12) are transferred to an object to be processed (20). In this connection, the film (II) for fine pattern formation is pressed against the object to be processed (20), with the surface that is provided with the first mask layer (13) facing the surface of the object to be processed (20); the first mask layer (13) is irradiated with an energy ray; and then the cover film (10) is separated from the second mask layer (12) and the first mask layer (13). In this connection, the pressing and the energy ray irradiation are separately carried out. The object to be processed is etched using the second mask layer (12) and the first mask layer (13).

Description

technical field [0001] The invention relates to a transfer printing method and a thermal nanoimprinting device. Background technique [0002] Traditionally, photolithography technology has been widely used as a processing technology for the concave-convex structure in the manufacture of LSI. However, photolithography has a problem in that it is difficult to process a concavo-convex structure with a size smaller than the wavelength of light used in exposure. In addition, as another technique for processing the uneven structure, there is a masked uneven structure drawing technique (EB method) using an electron beam drawing apparatus. However, in the EB method, since the uneven structure of the mask is directly drawn by an electron beam, there is a problem that the more the uneven structure is drawn, the drawing time increases, and the throughput until the uneven structure is formed is greatly reduced. In addition, these methods also have a problem of increased equipment cost...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B29C59/04B29C65/02H01L21/027B29L7/00
CPCG03F7/0002Y10T428/24628B29K2033/08B29K2105/0005B29C59/04H01L21/0274B29C59/022B29C59/026B29C59/046B29C59/16
Inventor 细见尚希古池润山口布士人
Owner ASAHI KASEI KK