Unlock instant, AI-driven research and patent intelligence for your innovation.

Positioning system, lithographic apparatus and device manufacturing method

A positioning system and lithography equipment technology, applied in the field of manufacturing devices, can solve problems affecting equipment productivity, equipment downtime, time-consuming, etc.

Active Publication Date: 2017-03-29
ASML NETHERLANDS BV
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Often, this calibration can be time consuming and can result in significant downtime of the equipment, thus adversely affecting the productivity of the equipment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Positioning system, lithographic apparatus and device manufacturing method
  • Positioning system, lithographic apparatus and device manufacturing method
  • Positioning system, lithographic apparatus and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] figure 1 A lithographic apparatus according to one embodiment of the invention is schematically shown. The apparatus comprises an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. UV radiation or any other suitable radiation), configured to support a patterning device (e.g. a mask) MA and connected to a The parameters precisely position the support structure of the first positioner PM of the patterning device or the patterning device holder (eg mask stage) MT. The apparatus also includes a substrate table (eg, wafer table) WT or substrate holder configured to hold a substrate W (eg, a resist-coated wafer). The substrate table WT is connected to a second positioner PW configured to precisely position the substrate according to certain parameters. The apparatus further comprises a projection system (eg a refractive projection lens system) PS configured to project the pattern applied to the radiation beam B by the patterning device MA...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to View More

Abstract

There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of US Provisional Application Serial No. 61 / 660,471, filed June 15, 2012, which application is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to a positioning system, a lithographic apparatus and a method for manufacturing a device. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a substrate, typically onto a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively called a mask or reticle, may be used to create the circuit pattern to be formed on the individual layers of the IC. The pattern may be transferred onto a target portion (eg, a portion comprising one or several dies) on a substrate (eg, a silicon wafer). The transfer of the pattern is usually...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70775G03F7/70783
Inventor R·A·C·M·比伦斯A·B·热因克M·M·J·范德瓦尔W·H·T·M·安格南特R·H·A·范莱肖特H·M·J·范德格罗伊斯S·W·范德霍伊文
Owner ASML NETHERLANDS BV