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Display substrate, display panel, manufacturing method thereof, and display device

A manufacturing method and display substrate technology, which can be applied in the fields of final product manufacturing, sustainable manufacturing/processing, photovoltaic power generation, etc., and can solve problems such as the influence of display substrates and display panel manufacturing processes

Inactive Publication Date: 2018-03-27
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The invention provides a display substrate, a display panel and a manufacturing method thereof, which are used to solve the problem that the display substrate, the display panel and the manufacturing process thereof are affected when the grating is fabricated on the outer surface of the display panel

Method used

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  • Display substrate, display panel, manufacturing method thereof, and display device
  • Display substrate, display panel, manufacturing method thereof, and display device
  • Display substrate, display panel, manufacturing method thereof, and display device

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Embodiment Construction

[0056] In the prior art, when the display substrate and the grating are integrated, since the light-shielding stripes of the grating are made of black photoresist, in order to meet a sufficiently low light transmittance, the thickness is relatively thick, often several microns, resulting in subsequent formation The problem that the substrate substrate is not firmly adsorbed when displaying the film layer. However, if the display film layer is formed first, the manufacturing process of the grating will have an impact on the display film layer.

[0057]In view of the above-mentioned technical problems, the present invention provides a method for manufacturing a display substrate. The method first forms a grating stripe pattern on one surface of the base substrate through a stable interposer, wherein the interposer and the base substrate One of them has the property of adsorbing a certain opaque material, and the other does not have the property of adsorbing said opaque material....

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Abstract

The invention relates to the field of display technology, and discloses a display substrate, a display panel, a manufacturing method thereof, and a display device. The display substrate includes a grating, wherein the grating is formed in two steps: firstly, an intermediary layer with stable properties (including corrosion resistance, not easy to fall off, etc.) is used to form a stripe pattern distributed at intervals, and then the intermediary layer or the base substrate is used to absorb and impermeable The light material forms light-shielding stripes. And the required display film layers are formed between the two steps. Since the interposer does not need to have a sufficiently low light transmittance, the thickness is relatively thin, so that the substrate substrate can be firmly adsorbed when the display film is formed, and the stable characteristics make the interposer not pollute the process chamber for forming the display film. , improving the yield rate of the three-dimensional display device and the dual-view field display device, and reducing the process difficulty.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a display substrate, a display panel, a manufacturing method thereof, and a display device. Background technique [0002] Grating fabrication is an important technology in 3D display and dual field of view display. Wherein, the grating is composed of a group of light-shielding stripes and light-transmitting stripes spaced therebetween. [0003] In the prior art, the grating can be fabricated by photolithography of black photoresist, and the specific process is as follows: [0004] Coating black photoresist on the transparent substrate; [0005] Baking the black photoresist at high temperature to harden it; [0006] Exposing the photoresist with a mask; [0007] Place the substrate together with the exposed photoresist in the developer for development, the exposed photoresist will be retained, and the unexposed photoresist will be washed away, thus forming light-shiel...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02F1/1335G02F1/1333G02B5/18H10K99/00
CPCG02B5/18G02F1/1335H10K59/8792Y02E10/549G02F1/133524G02B5/003G02F1/133512Y02P70/50G02F1/133562H10K77/10H10K50/858H10K50/865G02F1/133514
Inventor 武延兵
Owner BOE TECH GRP CO LTD
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