Electrochromic display device, manufacturing method thereof, cathode structure of electrochromic display device and micro-grid array of electrochromic display device
A display device, electrochromic technology, applied in instruments, nonlinear optics, optics, etc., can solve the problems of high process difficulty, contamination of cathode materials by sealing materials, contamination of anode materials, etc., to achieve the effect of simplifying process difficulty
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[0026] An embodiment of the present invention also provides a method for manufacturing an electrochromic display device, including: forming a cathode film on a first conductive substrate; forming a barrier bar on at least one side of the cathode film, and the barrier bar is vertical The thickness in the direction of the first conductive substrate is the same as the thickness of the cathode film; a microgrid array is formed on the second conductive substrate, and the height of three of the outer walls around the microgrid array exceeds The height of the micro-grid in the micro-grid array is to form a drawer-shaped guide groove with a gap above the micro-grid array, the excess height is the same as the thickness of the cathode film, and the internal dimension of the drawer-shaped guide groove is Matching the peripheral size of the cathode film with the barrier strip; filling the anode material in each of the microgrids of the microgrid array; making the cathode film and the side ...
Embodiment 1
[0032] An embodiment of the present invention provides an electrochromic display device, referring to Figure 2 ~ Figure 4 , to describe the structure of the device in detail.
[0033] The electrochromic display device includes: a microgrid array 32 , a cathode film 22 , a first conductive substrate 21 and a sealing material (not shown in the figure) sequentially formed on a second conductive substrate 31 . Each microgrid 33 in the microgrid array 32 is filled with an anode material (not shown), and the sealing material is used to seal the cathode film 22 and the anode material; at least one side of the cathode film 22 has Barrier strip 23, the thickness d2 of this barrier strip 23 in the direction perpendicular to the first conductive substrate 21 is the same as the thickness d1 of the cathode film; the height of three outer walls in the outer walls 34 around the micro grid array 32 exceeds The height of the microgrid 33 is such that a drawer-shaped guide groove 35 with a ga...
Embodiment 2
[0039] This embodiment provides a method for preparing an electrochromic display device, such as Figure 2-4 As shown, the method includes the following steps.
[0040] Step 1, forming a cathode thin film 22 on the first conductive substrate 21 .
[0041] Step 2, forming barrier strips 23 on the side of the cathode film 22 .
[0042] Specifically, such as figure 2 As shown, at least one side of the cathode film 22 is coated with a radiation curable material and photocured to form a barrier strip 23 on the at least one side of the cathode film 22, and the barrier strip 23 is vertically The thickness d2 in the direction of the first conductive substrate 21 is the same as the thickness d1 of the cathode film 22 .
[0043] It should be noted that the number of blocking bars 23 is not limited to figure 2 The one shown, preferably three, can be formed on the three sides of the cathode film respectively. When the cathode film with barrier strips on the three sides is fastened w...
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Abstract
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