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A developing device and developing method

A technology of developing equipment and developing method, which is applied in the direction of photosensitive material processing, etc., can solve the problems of excessive development of substrate photoresist, poor quality of substrate products, and prolonged process cycle.

Active Publication Date: 2018-09-18
HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Embodiments of the present invention provide a developing device and a developing method, which are used to solve the problems of poor quality of substrate products and prolonged process cycle due to excessive development of photoresist on the substrate caused by the substrate staying in the developing unit

Method used

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  • A developing device and developing method

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Embodiment 1

[0044] Embodiment 1 of the present invention provides a developing device 20, such as figure 2 As shown, it is a schematic structural diagram of the developing device 20 described in the embodiment of the present invention, wherein, and figure 1 The existing spray developing device 10 shown is similar, and the developing device 20 may include four areas: a substrate waiting area 11, a developing area 12, a water washing area 13 and an air washing area 14, wherein:

[0045]The developing area 12 is provided with a signal processing system 21, a mobile air-drying system 22 and a plurality of sensors 23;

[0046] The plurality of sensors 23 can be used to generate position sensing information related to the substrate 24 being developed; for example, for any sensor 23, when the sensor 23 senses the substrate 24, it can generate a position related to the substrate 24 induction information;

[0047] The signal processing system 21 can be used to determine whether the substrate 24...

Embodiment 2

[0064] Embodiment 2 of the present invention provides a developing method, such as image 3 As shown, it is a schematic flow chart of the development method described in Embodiment 2 of the present invention, and the method may include the following steps:

[0065] Step 301: The signal processing system determines whether the substrate is staying in the developing area according to the position sensing information related to the developing substrate generated by a plurality of sensors.

[0066] Step 302: The signal processing system controls the mobile air-drying system to start when it is determined that the substrate stays in the developing area and the developing time of the substrate reaches the set developing time.

[0067] That is to say, in the technical solution of the embodiment of the present invention, the signal processing system can determine whether the substrate stays in the developing area according to the position sensing information related to the developing ...

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PUM

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Abstract

The invention discloses developing equipment and a developing method. A signal processing system, a movable air-drying system and a plurality of sensors are arranged in a developing area of the developing equipment; the signal processing system in the developing equipment can be used for determining whether to stop a substrate in the developing area or not according to position inducting information, associated with the developing substrate, generated by the sensors, and controlling the mobile air-drying system to remove a developing liquid on the substrate when the substrate is determined to stop in the developing area and the developing time length of the substrate is determined to reach set developing time length, so that the excessive developing problem of photoresist on the substrate due to the fact that the substrate is stopped on a developing unit is avoided, the substrate product quality is improved, and the process period is shortened.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a developing device and a developing method. Background technique [0002] TFT-LCD (Thin film Transistor Liquid Crystal Display, thin film transistor liquid crystal display) has the characteristics of small size, low power consumption, and no radiation, and occupies a mainstream position in the current flat panel display market. Among them, since the TFT array substrate is an important part of the TFT-LCD display, improving the yield of the TFT array substrate and reducing the number of reworks in the preparation process of the TFT array substrate can improve the display quality. [0003] In the process of preparing the TFT array substrate, most of the processes such as gluing, exposure, and development are performed. Among them, the developing equipment is mainly used to remove the photoresist on the exposed glass substrate, and form the required pattern in advan...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/30
Inventor 马骏黄寅虎韩俊号韩领
Owner HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD