Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A support method for a shallow-buried and large-span tunnel with a small clear distance and four lanes

A four-lane, small clear distance technology, applied in the field of engineering, can solve the problems of low construction efficiency, long construction period, hidden dangers of construction, etc., and achieve the effect of improving construction efficiency, reducing construction risks, and eliminating hidden safety hazards.

Active Publication Date: 2018-03-13
SHENZHEN MUNICIPAL DESIGN & RES INST
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing shallow-buried long-span tunnel with small clear distance and four lanes has the following technical problems: the structural design is unreasonable, and there are certain hidden dangers in construction; the construction method and process are not standardized, resulting in low structural strength and safety stability of the tunnel
In addition, there are problems such as low construction efficiency, long construction period and high cost.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A support method for a shallow-buried and large-span tunnel with a small clear distance and four lanes
  • A support method for a shallow-buried and large-span tunnel with a small clear distance and four lanes
  • A support method for a shallow-buried and large-span tunnel with a small clear distance and four lanes

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0020] The support method for shallow-buried large-span tunnels with small clear distance and four lanes in this embodiment is suitable for V-level and similar weak clay strata of shallow-buried mountain tunnels. Because it is relatively broken and soil-like, reasonable construction steps and support structures can Reduce construction risks and improve construction efficiency. Among them: the design parameters of the shallow-buried long-span tunnel supported accord...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a support method for a shallow-buried large-span tunnel with four lanes in a small clear distance, comprising: Step S10, constructing two tunnels longitudinally staggered, the stagger distance being not less than 40m, carrying out long shed pipes at the entrance of the tunnel in advance, and small conduits for grouting in advance and hollow grouting bolt operation, which is used to strengthen the surrounding rock by grouting to form a composite lining support structure; step S20, dynamically judge the stability of the surrounding rock and the support system according to the changes in the mechanical form of the surrounding rock and support system after tunnel excavation. Reliability of the protection system, process the information obtained from construction monitoring, establish the judgment criterion, and adjust and modify the surrounding rock level, support parameters and composite support lining structure according to the judgment criterion. Implementing the support method of the present invention for a shallow-buried large-span tunnel with a small clear distance and four lanes is used to excavate a separate two-cavity tunnel in two directions in a V-level surrounding rock with a relatively broken rock body, so as to meet the safety of tunnel construction and reduce construction risks. On the other hand, it can improve construction efficiency and save construction period.

Description

technical field [0001] The invention relates to the field of engineering, in particular to a support method for a shallow-buried large-span tunnel with a small clear distance, four lanes, and a split-type two-cavity tunnel dug bidirectionally in V-level surrounding rocks with relatively broken rock bodies. Background technique [0002] In the prior art, due to considerations of route planning requirements and terrain constraints, it is sometimes unavoidable to adopt tunnels with a small clear distance for traffic routes. The traditional small distance tunnel has the problem of mutual influence between structural safety and construction, and measures must be taken to solve it. Due to the great technical difficulty and risk in the design of a single-hole four-lane tunnel with a small clear distance, it will be very difficult to study the structure of a four-lane shallow-buried long-span tunnel with a small clear distance and to carry out a safe and reasonable four-lane tunnel ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): E21D11/00E21D11/10E21D11/38E21F16/02
Inventor 刘建国王文通吴永照王建新丁华兴彭琦陈鸿许华林
Owner SHENZHEN MUNICIPAL DESIGN & RES INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products