Array substrate structure and manufacturing method thereof
A technology of array substrate structure and fabrication method, which is applied in semiconductor/solid-state device manufacturing, instruments, semiconductor devices, etc., can solve the problems of poor light transmittance, reduced light transmittance of the common electrode 910, affecting panel display effect, etc., and achieves high transmittance. Overrate, reduce impact, improve display effect
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[0058] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0059] see image 3 and Figure 4 , the present invention provides an array substrate structure for a touch display panel, which includes a substrate 1, a buffer layer 2 disposed on the substrate 1, a semiconductor layer 3 disposed on the buffer layer 2, and a semiconductor layer disposed on the buffer layer 2. The gate insulating layer 41 on the buffer layer 2 and the semiconductor layer 3, the interlayer dielectric layer 42 disposed on the gate insulating layer 41, the source / drain disposed on the interlayer dielectric layer 42 5. The flat layer 6 disposed on the source / drain 5 and the interlayer dielectric layer 42, the second metal layer 7 disposed on the flat layer 6, the second metal layer 7 disposed on the flat layer The first insulat...
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