Sputtering target containing Co or Fe

A sputtering target and particle technology, applied in the field of magnetic thin films and magnetic material sputtering targets, can solve problems such as insufficient conditions, and achieve the effects of cost improvement and yield improvement

Active Publication Date: 2015-09-09
JX NIPPON MINING & METALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] However, the reality is that neither of these conditions is sufficient and calls for further improvement

Method used

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  • Sputtering target containing Co or Fe
  • Sputtering target containing Co or Fe
  • Sputtering target containing Co or Fe

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0070] Co powder with an average particle size of 4 μm, Cr powder with an average particle size of 5 μm, and Pt powder with an average particle size of 3 μm are prepared as metal raw material powders, and TiO with an average particle size of 1.2 μm is prepared as a non-magnetic material powder. 2 Powder, spherical SiO with an average particle size of 0.7 μm 2 Powder, Cr with an average particle size of 1 μm 2 o 3powder. In addition, Co coarse powder adjusted to a particle diameter in the range of 50 μm to 150 μm was prepared, and the ratio of Co powder with an average particle diameter of 4 μm to the Co coarse powder was 7:3 by weight. 2000 g of these powders were weighed according to the following composition ratio.

[0071] Composition: 69Co-18Pt-2Cr-5SiO 2 -2TiO 2 -4Cr 2 o 3 (mol%)

[0072] Then, except for the Co coarse powder, weighed powders were enclosed in a 10-liter ball mill pot together with tungsten alloy balls as a grinding medium, and mixed by rotating fo...

Embodiment 2

[0080] Co powder with an average particle size of 4 μm, Pt powder with an average particle size of 3 μm, Ru powder with an average particle size of 7 μm, and Ta powder with an average particle size of 6 μm were prepared as metal raw material powders, and TiO with an average particle size of 1.2 μm was prepared as an oxide powder. 2 Powder, spherical SiO with an average particle size of 0.7 μm 2 Powder, CoO powder with an average particle size of 0.8 μm, B with an average particle size of 5 μm 2 o 3 powder. In addition, Co coarse powder adjusted to a particle diameter in the range of 50 μm to 300 μm was prepared, and the ratio of the Co powder with an average particle diameter of 4 μm to the Co coarse powder was 7:3 by weight. 2000 g of these powders were weighed according to the following composition ratio.

[0081] Composition: 61.2Co-22Pt-3Ru-0.8Ta-6SiO 2 -2TiO 2 -4CoO-1B 2 o 3 (mol%)

[0082] Then, except for the Co coarse powder, weighed powders were enclosed in a ...

Embodiment 3

[0086] Co powder with an average particle size of 4 μm, Pt powder with an average particle size of 3 μm, Co-B powder with an average particle size of 7 μm, and TiO with an average particle size of 1.2 μm were prepared as metal raw material powders. 2 Powder, spherical SiO with an average particle size of 0.7 μm 2 Powder, MnO powder with an average particle size of 0.8 μm, Co with an average particle size of 2 μm 3 o 4 powder. In addition, Co coarse powder adjusted to a particle diameter in the range of 50 μm to 300 μm was prepared, and the ratio of the Co powder with an average particle diameter of 4 μm to the Co coarse powder was 7:3 by weight. 2000 g of these powders were weighed according to the following composition ratio.

[0087] Composition: 63Co-21Pt-3B-6SiO 2 -2TiO 2 -4MnO-1Co 3 o 4 (mol%)

[0088] Then, except for the Co coarse powder, weighed powders were enclosed in a 10-liter ball mill pot together with tungsten alloy balls as a grinding medium, and mixed ...

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Abstract

The structure observed on the polished surface in this sintered sputtering target is configured from metal particles and a metal phase in which non-magnetic material particles with an average particle diameter of 1.8μm or less are dispersed and which contains Co or Fe. Defining the maximum diameter as the greatest value of the distance between any two points on the outer periphery of a non-magnetic material particle and the minimum diameter as the smallest value of the distance between two parallel lines when said lines sandwich the same particle, non-magnetic material particles in which the difference between the maximum diameter and the minimum diameter is less than or equal to 0.7μm make up 60% or more of the non-magnetic material particles in the structure observed on the polished surface of the target; and, defining the maximum diameter as the greatest value of the distance between any two points on the outer periphery of a metal particle and the minimum diameter as the smallest value of the distance between two parallel lines when these sandwich the metal particle, there are, in a 1mm2 field of view, on average 1 or more the metal particles for which the sum of the maximum value and the minimum value is 30μm or greater. This sputtering target can suppress abnormal discharge due to non-magnetic materials that cause the generation of particles during sputtering.

Description

technical field [0001] The present invention relates to a magnetic material sputtering target used for forming a magnetic thin film of a magnetic recording medium, especially a particle film in a magnetic recording medium of a hard disk using a perpendicular magnetic recording method, and relates to a magnetic material sputtering target capable of suppressing the generation of particles during sputtering The reason is the abnormal discharge of non-magnetic materials and the non-magnetic material particle dispersion type magnetic material sputtering target with Co or Fe as the main component. Background technique [0002] Materials based on Co, Fe, and Ni, which are ferromagnetic metals, are used for the recording layer of a hard disk employing a perpendicular magnetic recording method. Among them, composite materials containing ferromagnetic alloys such as Co-Cr bases, Co-Pt bases, Co-Cr-Pt bases, Fe-Pt bases and non-magnetic inorganic materials mainly composed of Co and Fe ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C22C19/07C22C38/00B22F3/00B22F3/14C22C1/05
CPCC22C33/02C22C32/0026C22C38/00C22C19/07C22C38/002C23C14/3414
Inventor 荒川笃俊高见英生中村祐一郎
Owner JX NIPPON MINING & METALS CO LTD
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