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Sputtering targets containing co or fe

A sputtering target and particle technology, applied in sputtering plating, ion implantation plating, coating, etc., can solve problems such as insufficient conditions, and achieve the effect of cost improvement and yield increase

Active Publication Date: 2018-02-16
JX NIPPON MINING & METALS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] However, the reality is that neither of these conditions is sufficient and calls for further improvement

Method used

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  • Sputtering targets containing co or fe
  • Sputtering targets containing co or fe
  • Sputtering targets containing co or fe

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0070] Co powder with an average particle size of 4 μm, Cr powder with an average particle size of 5 μm, and Pt powder with an average particle size of 3 μm are prepared as metal raw material powders, and TiO with an average particle size of 1.2 μm is prepared as a non-magnetic material powder. 2 Powder, spherical SiO with an average particle size of 0.7 μm 2 Powder, Cr with an average particle size of 1 μm 2 o 3powder. In addition, Co coarse powder adjusted to a particle diameter in the range of 50 μm to 150 μm was prepared, and the ratio of Co powder with an average particle diameter of 4 μm to the Co coarse powder was 7:3 by weight. 2000 g of these powders were weighed according to the following composition ratio.

[0071] Composition: 69Co-18Pt-2Cr-5SiO 2 -2TiO 2 -4Cr 2 o 3 (mol%)

[0072] Then, except for the Co coarse powder, weighed powders were enclosed in a 10-liter ball mill pot together with tungsten alloy balls as a grinding medium, and mixed by rotating fo...

Embodiment 2

[0080] Co powder with an average particle size of 4 μm, Pt powder with an average particle size of 3 μm, Ru powder with an average particle size of 7 μm, and Ta powder with an average particle size of 6 μm were prepared as metal raw material powders, and TiO with an average particle size of 1.2 μm was prepared as an oxide powder. 2 Powder, spherical SiO with an average particle size of 0.7 μm 2 Powder, CoO powder with an average particle size of 0.8 μm, B with an average particle size of 5 μm 2 o 3 powder. In addition, Co coarse powder adjusted to a particle diameter in the range of 50 μm to 300 μm was prepared, and the ratio of the Co powder with an average particle diameter of 4 μm to the Co coarse powder was 7:3 by weight. 2000 g of these powders were weighed according to the following composition ratio.

[0081] Composition: 61.2Co-22Pt-3Ru-0.8Ta-6SiO 2 -2TiO 2 -4CoO-1B 2 o 3 (mol%)

[0082] Then, except for the Co coarse powder, weighed powders were enclosed in a ...

Embodiment 3

[0086] Co powder with an average particle size of 4 μm, Pt powder with an average particle size of 3 μm, Co-B powder with an average particle size of 7 μm, and TiO with an average particle size of 1.2 μm were prepared as metal raw material powders. 2 Powder, spherical SiO with an average particle size of 0.7 μm 2 Powder, MnO powder with an average particle size of 0.8 μm, Co with an average particle size of 2 μm 3 o 4 powder. In addition, Co coarse powder adjusted to a particle diameter in the range of 50 μm to 300 μm was prepared, and the ratio of the Co powder with an average particle diameter of 4 μm to the Co coarse powder was 7:3 by weight. 2000 g of these powders were weighed according to the following composition ratio.

[0087] Composition: 63Co-21Pt-3B-6SiO 2 -2TiO 2 -4MnO-1Co 3 o 4 (mol%)

[0088] Then, except for the Co coarse powder, weighed powders were enclosed in a 10-liter ball mill pot together with tungsten alloy balls as a grinding medium, and mixed ...

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Abstract

The present invention relates to a sintered body sputtering target. The structure observed on the polished surface of the target is composed of a metal phase containing Co or Fe and metal particles dispersed with non-magnetic material particles with an average particle diameter of 1.8 μm or less. When the maximum value of the distance between any two points located on the outer circumference of the non-magnetic material particle is set as the maximum diameter, and the minimum value of the distance between the two straight lines when the particle is clamped by two parallel straight lines is set as the minimum diameter, the The difference between the maximum diameter and the minimum diameter is 0.7 μm or less of the non-magnetic material particles relative to the non-magnetic material particles in the structure observed on the polished surface of the target is 60% or more, and, in the When the maximum value of the distance between two arbitrary points is defined as the maximum diameter, and the minimum value of the distance between the two straight lines when metal particles are sandwiched between two parallel lines is defined as the minimum diameter, the sum of the maximum diameter and the minimum diameter is 30 μm or more There is an average of one or more metal particles within a field of view of 1 mm2, and this sintered sputtering target can suppress abnormal discharge caused by a non-magnetic material that causes particle generation during sputtering.

Description

technical field [0001] The present invention relates to a magnetic material sputtering target used for forming a magnetic thin film of a magnetic recording medium, especially a particle film in a magnetic recording medium of a hard disk using a perpendicular magnetic recording method, and relates to a magnetic material sputtering target capable of suppressing the generation of particles during sputtering The reason is the abnormal discharge of non-magnetic materials and the non-magnetic material particle dispersion type magnetic material sputtering target with Co or Fe as the main component. Background technique [0002] Materials based on Co, Fe, and Ni, which are ferromagnetic metals, are used for the recording layer of a hard disk employing a perpendicular magnetic recording method. Among them, composite materials containing ferromagnetic alloys such as Co-Cr bases, Co-Pt bases, Co-Cr-Pt bases, Fe-Pt bases and non-magnetic inorganic materials mainly composed of Co and Fe ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34C22C19/07C22C38/00B22F3/00B22F3/14C22C1/05
CPCC22C19/07C22C38/00C23C14/3414C22C38/002C22C32/0026C22C33/02
Inventor 荒川笃俊高见英生中村祐一郎
Owner JX NIPPON MINING & METALS CORP
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