Unlock instant, AI-driven research and patent intelligence for your innovation.

Apodization for pupil imaging scatterometry

A pupil and apodization technology, applied in the field of optical metrology, can solve problems such as noise

Active Publication Date: 2015-09-09
KLA TENCOR TECH CORP
View PDF7 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, for optical metrology systems employing coherent illumination sources, such as laser-based systems with high spatial and temporal coherence, substantial noise issues arise

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Apodization for pupil imaging scatterometry
  • Apodization for pupil imaging scatterometry
  • Apodization for pupil imaging scatterometry

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] Reference will now be made in detail to the disclosed subject matter which is illustrated in the accompanying drawings.

[0028] Figures 1 to 10B An apodization scheme for an optical metrology system 100 such as an angle-resolved (pupil imaging) scatterometer or the like is generally illustrated. According to various embodiments, apodization at the pupil and / or detector plane enables high performance metrology on targets with relatively small dimensions. Furthermore, the following embodiments include configurations that are associated with certain advantages in measurement quality, performance and / or accuracy. It should be noted that the embodiments described below provide illustrative purposes and that various parts of multiple embodiments may be combined to achieve further embodiments with selected advantages.

[0029] In general, the following embodiments relate to one or more of the following advantages. Embodiments of the system 100 may include configurations f...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

Description

[0001] priority [0002] The present application asserts the title of "APODIZATION FOR PUPIL IMAGING SCATTEROMETRY METROLOGY" filed on November 27, 2012 by Andy Hill et al. Priority of U.S. Provisional Application No. 61 / 730,383, which is currently co-pending or is an application of the currently co-pending application(s) entitled to the filing date. The entirety of the aforementioned Provisional Application is hereby incorporated by reference. technical field [0003] The present invention relates generally to the field of optical metrology, and more particularly, to apodization for optical metrology systems. Background technique [0004] Optical metrology is commonly used during semiconductor manufacturing to measure optical and / or structural properties of devices or test features. For example, optical or structural properties may include critical dimensions such as height, sidewall angle, pitch, line width, film thickness, refractive index, and overlap between exposure...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/47H01L21/66
CPCG01N21/55G03F7/70633G03F7/70625G02B27/58G01N21/47G01B11/00G01N2201/06113G01N2201/068
Inventor 安德鲁·W·希尔阿姆农·玛纳森巴拉克·布林戈尔茨欧哈德·巴沙尔马克·吉诺乌克泽夫·博姆索恩丹尼尔·坎德尔
Owner KLA TENCOR TECH CORP