Light-emitting diode epitaxial wafer and manufacturing method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- HC SEMITEK SUZHOU
- Publication Date
- 2018-03-06
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Abstract
Description
technical field
[0001] The invention relates to the field of light-emitting diodes, in particular to a light-emitting diode epitaxial wafer and a manufacturing method thereof. Background technique
[0002] As a very influential new product in the optoelectronics industry, LED has the characteristics of small size, long service life, colorful colors, and low energy consumption. It is widely used in lighting, display screens, signal lights, backlights, toys and other fields. Generally, LEDs are mainly composed of brackets, silver glue, chips, gold wires and epoxy resin. Among them, the chip is the core component of the LED, which is processed by epitaxial wafers through multiple processes. Therefore, the structure of the epitaxial wafer determines the quality of the LED.
[0003] The traditional GaN-based epitaxial wafer growth method is to grow an undoped GaN layer, an N-type layer, a multi-quantum well layer and a P-type layer sequentially on the substrate layer. Among th...