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Saturation method of graphite boat

A graphite boat and graphite technology, applied in the field of solar cells, can solve the problems of affecting the photoelectric conversion efficiency of cells, reducing the reflection effect of silicon nitride films, and uneven color of silicon chips, so as to avoid Rshfail, improve stability, and reduce The effect of chromatic aberration

Active Publication Date: 2015-12-02
TRINA SOLAR CO LTD +1
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Problems solved by technology

[0004] During the use of the graphite boat, due to the different surface states, it is easy to cause inconsistent film thickness of silicon nitride deposited on the surface of the silicon wafer, which is manifested in appearance, and the color is not uniform, that is, PECVD chromatic aberration; if the graphite boat is unstable, the thickness of the silicon wafer The uneven color will reduce the reflection effect of the silicon nitride film itself, and ultimately affect the photoelectric conversion efficiency of the cell

Method used

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Embodiment Construction

[0016] In order to enable those skilled in the art to better understand the solution of the present invention, the technical solution of the present invention will be clearly and completely described below in conjunction with specific embodiments.

[0017] A kind of saturation method of graphite boat is divided into graphite false sheet saturation stage and empty boat saturation stage, specifically comprises the following steps:

[0018] S1: False film saturation stage:

[0019] S1-1: Pretreatment of graphite dummy sheets: Insert graphite dummy sheets into the cassette, then put the cassette into the HF acid tank for cleaning for 2 hours, the concentration of HF is 15%~25%, then take it out and put it in the sink for cleaning for 2 hours, after taking it out Put it into a drying box and dry it at a temperature of 120~150°C for 2 hours;

[0020] S1-2: Pretreatment of graphite boat: put the graphite boat into the HF pickling tank for cleaning for 6~8 hours, the concentration of...

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Abstract

The invention relates to a saturation method of a graphite boat, and belongs to the technical field of solar cells. The saturation method comprises a fake-piece saturation stage and an empty-boat saturation stage. Saturation is performed through the combination of two ways, so that the Rsh of battery pieces is guaranteed and wafer range and inter-wafer range are reduced. The using effect of the saturated graphite boat is effectively improved; film thickness range of silicon wafers in the graphite boat is reduced; the stability of the graphite boat is improved, so that the surface color difference of the silicon wafers is reduced.

Description

technical field [0001] The invention relates to a saturation method of a graphite boat, which is used for covering the surface of the inner wall of the graphite boat with a silicon nitride film to make the surface state of the inner wall consistent, and belongs to the technical field of solar cells. Background technique [0002] Plasma Enhanced Chemical Vapor Deposition (PECVD) is a common technique to reduce the reflection of sunlight on the surface of silicon wafers and reduce the reflectivity. PECVD deposits a layer of silicon nitride film on the surface of solar cells to reduce the impact of sunlight on silicon wafers. The reflection of the surface of the sheet reduces the reflectivity. PECVD uses microwave or radio frequency to ionize the gas containing the constituent atoms of the film to form plasma locally, and the plasma is highly chemically active and easy to react, depositing the desired film on the substrate. In order to enable the chemical reaction to proceed a...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/458C23C16/513H01L31/18
CPCY02P70/50
Inventor 郭文祥
Owner TRINA SOLAR CO LTD
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