Unlock instant, AI-driven research and patent intelligence for your innovation.

a planar cathode

A flat cathode and cathode body technology, applied in the field of flat cathodes, can solve the problems of reduced production capacity, empty equipment, equipment shutdown, etc., and achieve the effects of reducing production shutdown time, ensuring product quality, and simple adjustment and operation.

Active Publication Date: 2018-03-09
上海晓睿真空科技有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in some processes that have very strict requirements on the uniformity of the film layer, these methods cannot realize the required process, or after realization, the uniformity will gradually deteriorate as the target is gradually etched, and the equipment needs to be broken out later. Make further adjustments to coating equipment, resulting in equipment shutdown, reduced production capacity, or poor product quality that makes it difficult to meet quality requirements

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • a planar cathode
  • a planar cathode
  • a planar cathode

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] see Figure 1 to Figure 5 , which is a schematic structural view and a cross-sectional view of a planar cathode 100 provided by the present invention. The planar cathode 100 includes a cover plate 1 , a cathode body base 14 , a magnet, and a displacement mechanism for changing the distance between the magnet and the target 191 . Preferably, the planar cathode 100 includes a seventh fastener 13 . The seventh fastener 13 fixedly connects the cover plate 1 and the cathode body base 14 . Further, the planar cathode 100 also includes a seventh fastener insulating sleeve 10 matched with the seventh fastener 13 . When the seventh fastener 13 is a conductor, the seventh fastener insulating sleeve 10 is sleeved on the seventh fastener 13 so that the cover plate 1 is insulated from the cathode body base 14 . In addition, the planar cathode 100 also includes an insulating plate 12 disposed between the cover plate 1 and the cathode body base 14 .

[0037] The cathode body base...

Embodiment 2

[0052] Please refer to 6, the difference between the second embodiment and the first embodiment is that the planar cathode 100 also includes a spacer 2 and a rear anode plate 32 arranged between the cover plate 1 and the cathode body base 14 , and the support rod 6 connected with the limit column 8. The spacer 2 is used to adjust the distance between the surface of the target and the cover plate 1, so as to adjust the distance between the target 191 and the substrate on different coating equipment. The spacer 2 is arranged between the back anode plate 32 and the cover plate 1 . Moreover, the spacer 2 is configured such that one end is fixedly connected to the back anode plate 32 , and the other end is connected to the cover plate 1 . The spacer 2 may be block-shaped, column-shaped, etc. Preferably, the planar cathode 100 includes an eighth fastener (not shown in the figure). The eighth fastener fixedly connects the spacer 2 and the back anode 32 , and those skilled in the a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a planar cathode, which comprises: a cathode body base, a magnet and a displacement mechanism. The base of the cathode body is provided with a cavity. The magnet is arranged on one side of the target to confine electrons to form plasma, and the magnet is movably arranged in the cavity. The displacement mechanism is movably arranged on the base of the cathode body, and extends into the cavity to drive the magnet to move. The planar cathode of the present invention adjusts the distance between the magnet and the target through the displacement mechanism, thereby changing the magnetic field intensity distribution on the surface of the target, and this adjustment does not require the coating equipment to be broken. The adjustment operation of the planar cathode is simple, the adjustment precision is high, and any strict requirements on the uniformity of the film layer can be realized, the product quality of the coating product is guaranteed, and the production capacity of the coating equipment is improved.

Description

technical field [0001] The invention relates to a vacuum magnetron sputtering device, in particular to a planar cathode. Background technique [0002] At present, none of the planar cathodes in the prior art has the function of directly adjusting the uniformity of the magnetic field on the atmospheric side. Film layer uniformity is a very important indicator in large-area magnetron sputtering coating equipment. There are many factors affecting the uniformity of magnetron sputtering coating, such as magnetic field distribution, gas distribution, electric field distribution and sputtering baffle opening and other factors. At present, the main method to improve the uniformity of the film layer is to ensure the uniformity of the magnetic field of the equipment, the uniformity of the gas distribution, and to adjust the opening size of the sputtering baffle, and to use these methods comprehensively. However, in some processes that have very strict requirements on the uniformity ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35
Inventor 郭江涛
Owner 上海晓睿真空科技有限公司