Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A New Optical Arm Amplified Two-Dimensional Linear Measuring Head

A measuring head and optical arm technology, which is applied in the field of a new type of optical arm enlarged two-dimensional line measuring head, can solve the problems of high cost, complex structure, and low precision.

Active Publication Date: 2019-05-28
成都中科卓尔智能科技集团有限公司
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to overcome the disadvantages of low precision of mechanical probe and trigger probe in the prior art, as well as the above-mentioned shortcomings of complex structure and high cost of scanning probe, and provide a simple structure and high measurement accuracy. The new light arm enlarged two-dimensional linear probe can move in a known plane to compensate the measurement deviation of the workpiece positioning caused by the displacement of the measuring ball when the measuring ball touches the workpiece to obtain the measured workpiece. More accurate measurement coordinates of the workpiece

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A New Optical Arm Amplified Two-Dimensional Linear Measuring Head
  • A New Optical Arm Amplified Two-Dimensional Linear Measuring Head
  • A New Optical Arm Amplified Two-Dimensional Linear Measuring Head

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] Such as figure 1 As shown, a new type of optical arm enlarged two-dimensional linear measuring head, including:

[0053] Two laser sources are used to emit two laser beams, that is, laser source one 11 emits laser beam one 21, and laser source two 12 emits laser beam two 22;

[0054] The probe base 4 includes at least two reflective surfaces for reflecting the laser beam emitted by each laser source, such as figure 2 Shown reflective surface one 41, reflective surface two 42, probe base 4 is provided with measuring rod 6 and measuring ball 7 for detection;

[0055] Two photodetectors, i.e. photodetector 1 31 and photodetector 2 32, are respectively used to receive laser beam 1 21 and laser beam 2 22 reflected by the reflective surface on the probe base 4;

[0056] The translation component is used to make the probe base 4 do a linear motion, or the probe base 4 and the photodetector make a linear motion together to change the laser beam-21, the laser beam on the refl...

Embodiment 2

[0070] Such as Figure 6 , 7 As shown, it is a schematic diagram of another structure of a novel optical arm amplified two-dimensional linear measuring head described in the present invention, including:

[0071] Two laser sources are used to emit two laser beams, that is, laser source one 11 emits laser beam one 21, and laser source two 12 emits laser beam two 22;

[0072] Probe base 4, comprising at least two reflective surfaces, such as Figure 7 The first reflective surface 41 and the second reflective surface 42 are used to reflect the laser beam emitted by each laser source, and the probe base 4 is provided with a measuring rod 6 and a measuring ball 7 for detection;

[0073] Two photodetectors, i.e. photodetector 1 31 and photodetector 2 32, are respectively used to receive laser beam 1 21 and laser beam 2 22 reflected by the reflective surface on the probe base 4;

[0074] The translation component is used to make the probe base 4 do a linear motion, or the probe ba...

Embodiment 3

[0079] The new optical arm amplified two-dimensional linear measuring head in this embodiment is basically the same as that in Embodiment 1, only the translation part and the return part are realized by a double reed structure, and the specific structure includes:

[0080] Such as Figure 1-7 As shown, two laser sources are used to emit two laser beams, that is, laser source one 11 emits laser beam one 21, and laser source two 12 emits laser beam two 22;

[0081] Probe base 4, comprising at least two reflective surfaces, such as Figure 8 The first reflective surface 41 and the second reflective surface 42 are used to reflect the laser beam emitted by each laser source, and the probe base 4 is provided with a measuring rod 6 and a measuring ball 7 for detection;

[0082] Two photodetectors, i.e. photodetector 1 31 and photodetector 2 32, are respectively used to receive laser beam 1 21 and laser beam 2 22 reflected by the reflective surface on the probe base 4;

[0083] Such...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a novel light arm amplifying two-dimensional linear probe. The probe comprises two laser sources for transmitting two laser beams and a probe base for reflecting the laser beams. The probe base comprises at least two reflecting surfaces, a measurement rod, and a measurement ball. The probe also comprises two photoelectric detectors for receiving the two reflected laser beams, a translation part for driving the probe base or the photoelectric detectors and the probe base to move linearly to change the positions of reflection points of the two laser beams on the reflecting surfaces, a reset part for resetting the probe base to an initial position, and a processing system for calculating and obtaining the displacement change value of the measurement ball. The probe can obtain the displacement values in two different linear directions through the two photoelectric detectors to compensate for the measurement deviation of a to-be-measured workpiece during positioning and to obtain more accurate measurement coordinates, so that the measurement precision is improved, the structure is simplified, the production cost is lowered, and batch processing and production are facilitated.

Description

technical field [0001] The invention relates to the technical field of precision measurement, in particular to a novel optical arm amplifying two-dimensional line measuring head. Background technique [0002] The probe is one of the key components of the precision measuring instrument. As a sensor, it provides the geometric position information of the workpiece to be measured. The development level of the probe directly affects the measurement accuracy and efficiency of the precision measuring instrument. Precision probes are usually divided into contact probes and non-contact probes, of which contact probes are divided into mechanical probes, trigger probes and scanning probes; non-contact probes are divided into laser probes probes and optical video probes. [0003] The mechanical probe is an earlier type of probe used in precision measuring instruments. The probe is used for position measurement through direct contact between the probe end and the workpiece to be measur...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/00
Inventor 张白康学亮
Owner 成都中科卓尔智能科技集团有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com