Method for Reducing Edge Positioning Error of Optical Proximity Correction

A technology for optical proximity correction and positioning error, which is applied in optics, originals for opto-mechanical processing, and photoengraving of patterned surfaces. and other problems to achieve the effect of improving OPC quality, reducing time, and improving process margins
CN105353586BActive Publication Date: 2019-10-25SEMICON MFG INT (SHANGHAI) CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SEMICON MFG INT (SHANGHAI) CORP
Publication Date
2019-10-25

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Abstract

The invention provides a method for reducing the edge positioning error of optical proximity correction. The method comprises the following steps: 1, optically simulating a mask plate figure; 2, parsing the contour of a contact; 3, calculating the edge positioning error of the counter; 4, judging whether the edge positioning error of the counter reaches a preset contour target range or not; 5, 1) examining the internal and / or external key dimensions of each of multiple side edges of the counter touches the limit of a mask plate design rule if the edge positioning error of the contour exceeds the contour target range, 2) moving the side edge if the dimension does not touch the limit and cutting off the corner of the side edge if the dimension touches the limit, and 3, replacing the mask plate figure in step 1 by a mask plate figure obtained in step 2, and afresh performing the method; and 5, completing the optical proximity correction of the mask plate figure if the edge positioning error of the contour reaches the contour target range.
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Description

technical field

[0001] The invention relates to the field of semiconductor manufacturing, in particular to a method for reducing edge positioning errors of optical proximity correction. Background technique

[0002] In the semiconductor manufacturing process, the photolithography process plays a central role and is the most important process step in the production of integrated circuits. In order to overcome a series of optical proximity effects (Optical Proximity Effect, OPE) caused by the reduction of the critical dimension (CD), the industry has adopted many resolution enhancement technologies (ResolutionEnhancement Technology, RET), including optical proximity correction ( Optical Proximity Correction, OPC), Phase Shifting Mask (Phase Shifting Mask, PSM) and other technologies.

[0003] Optical proximity correction is mainly to compare the simulated graphics to be exposed with the target graphics, establish the correction mode of the graphics to be exposed, and then use...

Claims

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