Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Quantum well combined LED epitaxial structure with high luminous efficiency and its preparation method

A technology with high luminous efficiency and multiple quantum well structure, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of high stress and low efficiency, and achieve the effects of reducing stress, improving device performance, and improving light extraction efficiency.

Active Publication Date: 2018-03-13
SHANDONG INSPUR HUAGUANG OPTOELECTRONICS
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0019] The present invention aims at the problems of low quantum efficiency and high stress in existing multi-quantum wells, and provides a quantum well combined LED epitaxial structure with high luminous efficiency. Curved to improve hole and electron injection active region efficiency and radiative recombination efficiency

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Quantum well combined LED epitaxial structure with high luminous efficiency and its preparation method
  • Quantum well combined LED epitaxial structure with high luminous efficiency and its preparation method
  • Quantum well combined LED epitaxial structure with high luminous efficiency and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0049] figure 2 The quantum well combination LED epitaxial structure with high luminous efficiency of the present invention is given, which can effectively reduce the stress between the well-barrier interface, alleviate the bending of the energy band, and improve the efficiency of hole and electron injection into the active region and the efficiency of radiation recombination. The epitaxial structure is substrate 1, buffer layer 2, undoped GaN layer 3, n-type AlGaN layer 4, n-type GaN layer 5, active layer 6, p-type AlGaN layer 7, p-type GaN layer from bottom to top 8 and P-type InGaN contact layer 9, with figure 1 The difference of the existing structures shown is that the active layer 6 includes a lower multi-quantum well structure, a constant temperature multi-quantum well structure and an upper multi-quantum well structure, and the lower multi-quantum well structure is an InxGa1-xN potential well layer 10 (0

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A quantum well combination LED epitaxial structure with high luminous efficiency and a preparation method thereof, the epitaxial structure is a substrate, a buffer layer, a non-doped GaN layer, an n-type AlGaN layer, an n-type GaN layer, an active Layer, P-type AlGaN layer, P-type GaN layer and P-type InGaN contact layer, the active layer includes the lower multi-quantum well structure, constant temperature multi-quantum well structure and upper multi-quantum well structure, the lower multi-quantum well structure is InGaN potential well layer The constant temperature multi-quantum well structure is composed of the periodic superposition of the constant temperature InGaN potential well layer and the constant temperature GaN potential well layer, and the upper multi-quantum well structure is the periodic superposition of the InGaN potential well layer and the GaN barrier layer Composition; the preparation method is to prepare each layer sequentially from bottom to top in the reaction chamber of metal organic chemical vapor deposition equipment. The invention can effectively reduce the stress between the well-barrier interface, ease the bending of the energy band, and improve the injection efficiency of holes and electrons into the active region and the radiation recombination efficiency.

Description

technical field [0001] The invention relates to an epitaxial structure of an active region LED (light emitting diode) capable of improving light extraction efficiency and a preparation method thereof, belonging to the technical field of LED epitaxy. Background technique [0002] In the early 1990s, the third-generation wide-bandgap semiconductor materials represented by nitrides made a historic breakthrough. Researchers successfully prepared blue-green and ultraviolet LEDs on gallium nitride materials, making LED lighting become possible. In 1971, the first gallium nitride LED die came out. In 1994, gallium nitride HEMTs appeared blue light GaN-based diodes with high electron mobility, and gallium nitride semiconductor materials developed very rapidly. [0003] Semiconductor light-emitting diodes have the advantages of small size, ruggedness, strong controllability of light-emitting bands, high luminous efficiency, low heat loss, low light decay, energy saving, and environm...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/06H01L33/32H01L33/00
CPCH01L33/0066H01L33/0075H01L33/06H01L33/32
Inventor 柳颜欣曲爽马旺徐现刚
Owner SHANDONG INSPUR HUAGUANG OPTOELECTRONICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products