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Gas purge device and gas purge method

A gas cleaning and gas introduction technology, which is applied in the fields of electrical components, semiconductor/solid-state device manufacturing, optics, etc., can solve problems such as cleaning gas leakage, hindering container sliding, and poor container positioning, so as to improve durability and prevent leakage.

Active Publication Date: 2016-04-06
MURATA MASCH LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If there are traces or damages on the nozzles of the gas introduction part, when the container is transported and brought into contact with other nozzles, the cleaning gas may leak due to the marks or damages on the nozzles of the gas introduction part.
In addition, due to traces and damages on the nozzle, the gas introduction part and the nozzle may be caught, preventing the container from sliding, and causing poor positioning of the container.

Method used

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  • Gas purge device and gas purge method
  • Gas purge device and gas purge method
  • Gas purge device and gas purge method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0031] Figure 1 to Figure 7 Indicates an example. The gas cleaning device 2 is installed in, for example, a storage or an automated warehouse, and positions and stores containers containing semiconductor substrates and reticles, while supplying cleaning gas into the containers. 4 is a shelf seat, which is supported by the pillar 5 of the storage. For example, three pins 6 protrude from the shelf seat 4, and are connected in the positioning groove of the storage to position the container. 8 is a nozzle for introducing cleaning gas, one or two are provided, protruding from the shelf base 4 to the upper part. The tip of the nozzle 8 has a circular tip surface 9, and a circular nozzle hole 10 is provided at the center thereof. Moreover, the material of the nozzle 8 is, for example, durable stainless steel, and the pipeline 12 of the cleaning gas is connected to the nozzle 8, and the nozzle 8 is fixed on the shelf base 4, that is, neither lifts nor slides horizontally.

[0032]...

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PUM

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Abstract

The present invention relates to a gas purge device and a gas purge method. The gas purge device prevents a gas introduction part of an elastic body from being damaged upon contact with a nozzle, and furthermore prevents the gas introduction part and the nozzle from adhering to each other. A container is positioned, and a purge gas is introduced from the nozzle into the gas introduction part provided in a bottom part of the container, the bottom face being round and having a gas introduction hole at the center, the gas introduction part comprising an elastic body. The nozzle is provided with a tip surface being at least as large as the bottom face of the gas introduction part and having a planar shape, and a nozzle hole positioned at the center of the tip surface and being at least as small as the gas introduction hole of the container, the tip surface being roughened or being configured from a low-friction material, the tip surface and the gas introduction part being slidable.

Description

technical field [0001] The present invention relates to gas cleaning of containers accommodating semiconductor substrates and the like. Background technique [0002] Currently, semiconductor substrates and reticles are stored in containers such as FOUPs and reticle boxes, and the containers are transported by transport equipment and stored in storage or automated warehouses. Among them, in order to prevent contamination and oxidation of articles, cleaning gas such as nitrogen gas and clean dry air is supplied into the container from the nozzle through the gas introduction part. In addition, the gas introduction part is constituted by a circular elastic body having a hole in the center or the like. Regarding the supply of purge gas, Patent Document 1 (Japanese Patent Application Laid-Open No. 2012-248785 ) proposes a scheme of introducing purge gas into the container through a nozzle that can be lifted and lowered freely by using a cylinder. [0003] prior art literature ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/673G03F1/66H01L21/027
CPCG03F1/66H01L21/67393H01L21/67389
Inventor 村田正直山路孝
Owner MURATA MASCH LTD
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