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Preparation method of atmospheric pressure plasma of basic copper nitrate

An atmospheric pressure plasma and plasma technology, applied in directions such as copper nitrate, can solve the problems such as limited popularization and application, high preparation cost of basic copper nitrate, complicated post-treatment process and the like

Active Publication Date: 2016-04-20
中消天盾等离子科技(大连)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing preparation methods of basic copper nitrate all need to use precipitants such as urea, sodium hydroxide or sodium carbonate, and need heating or ultrasound at the same time. The reaction time is generally more than 2 hours, and the post-treatment process is complicated.
These techniques make the preparation cost of basic copper nitrate higher, which greatly limits its further application.

Method used

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  • Preparation method of atmospheric pressure plasma of basic copper nitrate
  • Preparation method of atmospheric pressure plasma of basic copper nitrate
  • Preparation method of atmospheric pressure plasma of basic copper nitrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Weigh 1 g of copper nitrate, put it in a beaker, add 9 ml of deionized water, stir at room temperature until completely dissolved, and obtain an aqueous solution of copper nitrate with a mass fraction of 10%.

[0024] 1 milliliter of the above-mentioned solution was put into an atmospheric pressure dielectric barrier discharge plasma reactor, and argon gas (100ml min -1 ), adjust the discharge frequency to be 14.1kHz, the peak-to-peak value of the sinusoidal AC discharge voltage is 40kV, and the discharge gap is 4mm. Formula copper nitrate solid; conversion rate 100%.

[0025] The X-ray diffraction pattern and scanning electron microscope photo of embodiment 1 sample see respectively figure 1 and figure 2 .

[0026] figure 1 The XRD spectrum of shown embodiment 1 sample shows: take argon as working gas to generate plasma, after copper nitrate aqueous solution is processed, obtained pure basic copper nitrate;

[0027] figure 2 The SEM photo of the sample shown in...

Embodiment 2

[0029] Weigh 1 g of copper nitrate, put it in a beaker, add 9 ml of deionized water, stir at room temperature until completely dissolved, and obtain an aqueous solution of copper nitrate with a mass fraction of 10%.

[0030] 1 milliliter of the above-mentioned solution was put into an atmospheric pressure dielectric barrier discharge plasma reactor, and nitrogen gas (100ml min -1 ), adjust the discharge frequency to be 14.1kHz, the peak-to-peak value of the sinusoidal AC discharge voltage is 40kV, and the discharge gap is 4mm. Under the condition of atmospheric pressure, the copper nitrate solution is processed for 12min. Formula copper nitrate solid; conversion rate 100%.

[0031] The X-ray diffraction pattern of embodiment 2 sample sees image 3 .

[0032] image 3 The XRD spectrum of the sample shown in Example 2 shows that: nitrogen is used as the working gas to generate plasma, and after the copper nitrate aqueous solution is treated, pure basic copper nitrate is obtai...

Embodiment 3

[0034] Weigh 1 g of copper nitrate, put it in a beaker, add 9 ml of deionized water, stir at room temperature until completely dissolved, and obtain an aqueous solution of copper nitrate with a mass fraction of 10%.

[0035] Put 1 milliliter of the above solution into an atmospheric pressure dielectric barrier discharge plasma reactor, and in an open air atmosphere, adjust the discharge frequency to 14.1kHz, the sinusoidal AC discharge voltage peak-to-peak value is 40kV, and the discharge gap is 4mm. Next, the copper nitrate solution was treated for 12 minutes, and light blue basic copper nitrate solid was directly obtained after the treatment; the conversion rate was 100%.

[0036] The X-ray diffraction pattern of embodiment 3 sample sees Figure 4 .

[0037] Figure 4 The XRD spectrum of the sample shown in Example 3 shows that air is used as the working gas to generate plasma, and after the copper nitrate aqueous solution is treated, pure basic copper nitrate is obtained....

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Abstract

The invention discloses a preparation method of atmospheric pressure plasma of basic copper nitrate and belongs to the field of inorganic nonmetal material preparation. The method includes the following steps that 1, a water solution of copper nitrate is prepared, and the mass ratio of the copper nitrate is 0.01-60%; 2, the copper nitrate solution prepared in step 1 is placed into a plasma reactor, discharge gas is inert gas, oxygen or air, discharge atmospheric pressure is barometric pressure, the discharge voltage is 0.1 kV-40 kV direct current or alternating current high voltage, the treatment time is 2-15 minutes, then drying is conducted, and the basic copper nitrate is obtained. By means of the preparation method of the plasma, such precipitator as urea and caustic soda is avoided, no toxic or harmful reagent is needed, heating is not needed, and the preparation method is a simple, fast and environmentally-friendly novel basic copper nitrate preparation process.

Description

technical field [0001] The invention belongs to the field of preparation of inorganic non-metallic materials, in particular to an atmospheric-pressure plasma preparation method of basic copper nitrate. Background technique [0002] Basic copper nitrate has the characteristics of high effective oxygen content and large standard molar enthalpy of formation. It is an important oxidant in automobile airbags. In addition, basic copper nitrate is also commonly used as a catalyst and adsorbent due to its large specific surface area. The existing preparation methods of basic copper nitrate all require the use of precipitants such as urea, sodium hydroxide or sodium carbonate, and heating or ultrasound. The reaction time is generally more than 2 hours, and the post-treatment process is complicated. These techniques make the preparation cost of basic copper nitrate higher, which greatly limits its further popularization and application. [0003] The present invention adopts atmosphe...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G3/08
CPCC01G3/08C01P2002/72C01P2004/03
Inventor 底兰波张秀玲詹志彬段栋之
Owner 中消天盾等离子科技(大连)有限公司
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