An exposure method, an exposure device, and a color filter substrate

Abstract

The invention discloses an exposure method, an exposure apparatus and a color film substrate. The exposure method comprises: respectively arranging a first alignment mark at each of two vertex angles of a first side of a mask plate, and respectively arranging a second alignment mark at each of two vertex angles of a second side of the mask plate, which is opposite to the first side; respectively forming graphs of through holes on a black matrix layer position above a base substrate by utilizing the first alignment mark and the second alignment mark, and carrying out exposure; moving the base substrate in a direction where the second side points to the first side, controlling two through holes formed by the second alignment mark last time to be subjected to alignment exposure with the first alignment mark, and forming graphs of through holes to be aligned next time by utilizing the second alignment mark; and repeatedly moving the base substrate and carrying out alignment exposure until a graph of a black matrix is formed on the black matrix layer. According to the method, not only can an exposure beat be improved, but also alignment accuracy can be improved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an exposure method, an exposure device and a color filter substrate. Background technique [0002] In the manufacturing process of a color filter (Color Filter) of a thin film transistor liquid crystal display, manufacturing a black matrix (Black Matrix, BM for short) is the first process. [0003] At present, in the process of making the black matrix, before each exposure, the machine platform of the exposure machine needs to be set according to the program. figure 1 The mask plate (template used for exposure) shown in the figure is precisely positioned at the specified exposure position (x, y, θ) by the exposure method length measurement system, as figure 2 As shown, the alignment between each mask plate and the designated exposure position is realized. In this alignment method, the exposure cycle is longer and the alignment accuracy is lower. [0004] Therefore, how to imp...

AI Technical Summary

Problems solved by technology

[0003] At present, in the process of making the black matrix, before each exposure, the machine platform of the exposure machine needs to be set according to the program. figure 1 The mask plate (template used for exposure) shown in the figure is precisely positioned at the specified exposure position (x, y, θ) by the exposure method length measurement system, as figure 2 As shown, the alignment between each mask plate and the designated exposure position is realized. In this alignment method, the exposure cycle is longer and the alignment accuracy is lower.

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