Single-lens device for automatically detecting two-dimensional morphology and temperature of water substrate

An automatic detection and single-lens technology, applied in the direction of measuring devices, instruments, etc., can solve the problem of high cost and achieve the effect of cost reduction

Active Publication Date: 2016-06-22
NANCHANG ANGKUN CO LTD
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the single-lens type automatic detection device for the two-dimensional shape and temperature of the wafer substrate provided by this embodiment needs to use two lenses for integrating the temperature measurement device through the second light splitting element 14, that is, it is arranged on the laser emitting device, and is used to turn the laser The emitted divergent light is refracted into

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Single-lens device for automatically detecting two-dimensional morphology and temperature of water substrate
  • Single-lens device for automatically detecting two-dimensional morphology and temperature of water substrate
  • Single-lens device for automatically detecting two-dimensional morphology and temperature of water substrate

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0030] Example one

[0031] For ease of understanding, attach image 3 Only the light path diagram of one of the spots is given.

[0032] The single-lens type device for automatically detecting the two-dimensional topography and temperature of the wafer substrate provided by the present invention includes a single-lens type device for automatically detecting the two-dimensional topography and temperature of the wafer substrate, a second spectroscopic element, and a device for detecting the temperature of the wafer substrate.

[0033] The single-lens type automatic detection device for the two-dimensional topography and temperature of the wafer substrate includes N PSDs, N beams of lasers and a first beam splitting element. The N beams of lasers are arranged in a straight line, where N is a natural number above 3, and N PSDs are One-to-one correspondence of N beams of laser light. The N beams of laser light are reflected by the first beam splitting element and then incident on the sec...

Example Embodiment

[0062] Example two

[0063] See attached Figure 4 The difference between the single-lens type device for automatically detecting the two-dimensional topography and temperature of the wafer substrate provided in the second embodiment of the present invention and the first embodiment of the present invention is that the N beams of lasers consist of one attached Figure 5 The multi-channel laser emitting device shown emits. The multi-channel laser emitting device used in the single-lens type device for automatically detecting the two-dimensional shape and temperature of the wafer substrate provided by the present invention includes a multi-channel beam splitting prism 26 and a laser 25. The multi-channel beam splitting prism 26 includes a plurality of beam splitting surfaces. The two beam splitting surfaces are parallel, the angle α between the multiple beam splitting surfaces and the horizontal direction is 45°, the centers of the multiple beam splitting surfaces are on the same st...

Example Embodiment

[0068] Example three

[0069] The difference between the single-lens type automatic two-dimensional morphology and temperature detection device of the wafer substrate provided by the third embodiment of the present invention and the first and second embodiments of the present invention is that the single-lens type automatic detection wafer substrate provided by the third embodiment of the present invention The two-dimensional morphology and temperature device may also include a light transmitting device, which is arranged on the optical path through which the incident light and the first reflected beam pass together, and the light transmitting device is provided with N light holes and N light holes. The holes correspond to the N beams of laser light one-to-one, and the light-passing holes are provided with reflective mirrors 11 at intervals to turn the direction of the corresponding beams passing by 90°, so that the corresponding PSD can be turned to another direction, saving plac...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a single-lens device for automatically detecting the two-dimensional morphology and temperature of a water substrate, and belongs to the technical field of semiconductor material nondestructive testing. According to the single-lens device for automatically detecting the two-dimensional morphology and temperature of a water substrate, a lens is arranged behind a beam-splitting plain film before light beams are transmitted to a wafer substrate, and the lens is arranged in front of the beam-splitting plain film after second-type reflected light beams are formed. Thus, only one lens instead of two lenses is needed, or, there is no need for a laser and a detector to be each integrated with a lens during selection of the laser and the detector. Therefore, the cost of the device for detecting the two-dimensional morphology of a water substrate is reduced.

Description

technical field [0001] The invention relates to the technical field of non-destructive testing of semiconductor materials, in particular to a single-lens-type device for automatically detecting the two-dimensional shape and temperature of a wafer substrate. Background technique [0002] See attached figure 2 , the invention patent application with the application number 201410188236.2 discloses a device for automatic real-time and rapid detection of the two-dimensional shape of the wafer substrate. To the second light-splitting element 14, the incident light is formed after passing through the second light-splitting element 14, and the incident light is incident on the wafer substrate, and forms N incident points along the radial direction on the wafer substrate, and the incident light forms N beams after being reflected by the substrate. One kind of reflected light beams, each of the first kind of reflected light beams passes through the second light splitting element 14 a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01D21/02
Inventor 刘健鹏张瑭焦宏达
Owner NANCHANG ANGKUN CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products