Pressurizing device of single-crystal furnace

Abstract

The invention relates to a pressurizing device of a single-crystal furnace.The pressurizing device comprises a pressurizing cylinder, a piston, an air filling pipe, an air discharge pipe and a pressure valve, wherein the pressurizing cylinder is a semi-sealed cylinder, the piston is movably connected into the pressurizing cylinder, the top of the piston is connected with the shaft extension end of an air cylinder, the air cylinder is mounted at the bottom of an upper support, the air filling pipe is connected to the bottom of the pressurizing cylinder, a one-way valve is arranged between the air filling pipe and the pressurizing cylinder, the air discharge pipe is connected to the bottom of the pressurizing cylinder, an electromagnetic valve is arranged between the air discharge pipe and the pressurizing cylinder, an overflow channel is arranged on the piston, the pressure valve is mounted in the overflow channel, and an air filter is mounted on the air filling pipe.The pressurizing device is simple in structure, easy to manufacture, practical and efficient.

Description

technical field [0001] The patent of the present invention relates to the technical field of single crystal furnaces, in particular to a pressurizing device for single crystal furnaces. Background technique [0002] Single crystal furnace is the necessary equipment in the process of converting polycrystalline silicon into single crystal silicon, and single crystal silicon is the basic raw material in photovoltaic power generation and semiconductor industry. As the key supporting material of the modern information society, single crystal silicon is one of the most important single crystal materials in the world. It is not only the main functional material for the development of computers and integrated circuits, but also the main functional material for photovoltaic power generation and utilization of solar energy. [0003] In the process of pulling silicon single crystal, it needs to be carried out in a high-pressure environment, but as the pressure continues to increase, th...

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Problems solved by technology

[0003] In the process of pulling silicon single crystal, it needs to be carried out in a high-pressure environment, but as the pressure continues to increase, the single crystal furnace will also cause safety hazards, so it is particularly important to design a single crystal furnace pressurization device to prevent other Damage to its own structure due to excessive pressure

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