Coating device with multiple evaporation sources and coating method thereof

A coating device and evaporation source technology, which is applied in vacuum evaporation coating, sputtering coating, ion implantation coating, etc., can solve the problems that the evaporation rate cannot be monitored and adjusted, and the requirements of controllable and economical coating cannot be met. Achieve the effect of high degree of automation, simple and reasonable device structure, and high quality

Active Publication Date: 2016-08-24
OPTORUN SHANGHAI CO LTD
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

However, the above-mentioned empirical method has great blindness and does not meet the controllable and economical coating requirements; at the same time, it is impossible to monitor and adjust the evaporation rate of various film materials in the coating process in real time

Method used

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  • Coating device with multiple evaporation sources and coating method thereof
  • Coating device with multiple evaporation sources and coating method thereof

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Embodiment

[0022] Example: such as figure 1 As shown, the multi-evaporation source coating device in this embodiment includes a vacuum coating chamber 1, and the inner chamber of the vacuum coating chamber 1 is used as a coating space. Taking two evaporation sources as an example, a first evaporation source 2 and a second evaporation source 3 are respectively provided at the bottom of the vacuum coating chamber 1. During film coating, put in the first evaporation source 2 and the second evaporation source 3 respectively Different film materials can be used to evaporate multi-component film layers. Above the first evaporation source 2 and the second evaporation source 3, a first baffle plate 4 and a second baffle plate 5 are respectively arranged, and openings are respectively arranged on the first baffle plate 4 and the second baffle plate 5, and the openings satisfy only allowable The requirement that the film material molecules of the partial evaporation angle emitted from the evapora...

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Abstract

The invention relates to the technical field of vacuum coating and in particular relates to a coating device with multiple evaporation sources and a coating method thereof. The coating device is characterized in that a plurality of film thickness controllers are arranged in a vacuum coating chamber; one film thickness controller is arranged in the central position of a workpiece umbrella stand and is used for monitoring coating rates on coating substrates; and the rest of the film thickness controllers correspond to the evaporation sources one to one to respectively monitor and adjust the evaporation rate of each evaporation source. The coating device has the advantages that the coating device achieves simultaneous coating of multiple evaporation sources and accurately controls the coating rates and evaporation angles of the evaporation sources; the device has a simple and reasonable structure and a high degree of automation and is convenient to use; and coated multi-component films have good uniformity and high quality.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, in particular to a multi-evaporation source coating device and a coating method thereof. Background technique [0002] In the field of vacuum coating technology, it is often necessary to simultaneously coat multiple film materials to prepare functional films with specific optical, electrical and other physical properties. For example, in the process of preparing optical thin films, in order to obtain a film layer with an intermediate refractive index, high refractive index materials (such as Ta 2 o 5 , Nb 2 o 5 and ZrO 2 ) and low refractive index materials (such as SiO 2 and MgF 2 ) while vapor deposition to obtain the desired refractive index material. For different film materials, their melting points and electrical conductivity are often different. Therefore, it is necessary to place different film materials in different crucibles and use different evaporation conditions for sim...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/54
CPCC23C14/24C23C14/543
Inventor 李刚正龙汝磊吴萍
Owner OPTORUN SHANGHAI CO LTD
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