Double-layer synchronous tailoring system for home textile fabric
A double-layer, fabric technology, which is applied in the cutting of textile materials, thin material processing, textiles and papermaking, etc., can solve the problems of uneven fabrics on both sides of the cutting, uneven line lengths, waste of time, etc., to achieve cutting efficiency Accurate size, convenient mechanism adjustment, and improved cutting efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0019] In order to enable those skilled in the art to better understand the technical solution of the present invention, the technical solution of the present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0020] Refer to attached Figure 1-3 The shown is a double-layer synchronous cutting system for home textile fabrics, which sequentially includes a double-layer feeding device, a double-layer monolithic device, and a double-layer cutting platform from the feed end to the discharge end; the double-layer cutting platform includes an upper cutting platform. Platform 7 and lower cutting platform 8, the feeding end of described upper cutting platform 7 and described lower cutting platform 8 is all provided with at least one horizontal roller 17, is set between described upper cutting platform 7 and described lower cutting platform 8 The electric shear knife 9 that can cut up and down simultaneously; The electric shea...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com