Material treatment device with plasma jet array cooperating with mechanical rotational motion
A technology of plasma and rotary motion, applied in the direction of plasma and electrical components, can solve the problems of small working area, large area of material and uniform processing, etc., and achieve the effect of uniform processing
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0023] The content of the present invention will be further described in detail below with reference to the drawings and embodiments.
[0024] Reference Figure 1 to Figure 3 , The material processing device with plasma jet array coordinated with mechanical rotation movement of the present invention includes cavity 1, jet array 2, support 3, stage 4 and other parts. Among them, the multiple uniform plasma jets generated by the jet array 2 are coupled into large-area uniform low-temperature plasma through the interaction between the charged particles; the plasma generator is fixed on the top of the stage 4 by the bracket 3, and the direction can be realized. , Multi-dimensional adjustment of position and spacing; an electric turntable with adjustable speed is integrated in the stage 4, which can realize the uniform rotation of the material to be processed; plasma generation and material processing can be carried out in the cavity 1 according to actual needs . Finally, a large ar...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap