Material treatment device with plasma jet array cooperating with mechanical rotational motion

A technology of plasma and rotary motion, applied in the direction of plasma and electrical components, can solve the problems of small working area, large area of ​​material and uniform processing, etc., and achieve the effect of uniform processing

Inactive Publication Date: 2016-10-19
XI AN JIAOTONG UNIV
View PDF6 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The plasma jet is generally generated in a medium tube and drawn out by the air flow. Its active area is usually small, and it is difficult to achieve large-area and uniform treatment of the surface of the material. In industrial applications, the uniformity of the surface properties of the material have higher requirements
Expanding the plasma jet into a jet

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Material treatment device with plasma jet array cooperating with mechanical rotational motion
  • Material treatment device with plasma jet array cooperating with mechanical rotational motion
  • Material treatment device with plasma jet array cooperating with mechanical rotational motion

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0023] The content of the present invention will be further described in detail below with reference to the drawings and embodiments.

[0024] Reference Figure 1 to Figure 3 , The material processing device with plasma jet array coordinated with mechanical rotation movement of the present invention includes cavity 1, jet array 2, support 3, stage 4 and other parts. Among them, the multiple uniform plasma jets generated by the jet array 2 are coupled into large-area uniform low-temperature plasma through the interaction between the charged particles; the plasma generator is fixed on the top of the stage 4 by the bracket 3, and the direction can be realized. , Multi-dimensional adjustment of position and spacing; an electric turntable with adjustable speed is integrated in the stage 4, which can realize the uniform rotation of the material to be processed; plasma generation and material processing can be carried out in the cavity 1 according to actual needs . Finally, a large ar...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a material treatment device with a plasma jet array cooperating with mechanical rotational motion. The material treatment device comprises a cavity, the jet array, a support and an object table; multiple even plasma jets generated by the jet array are coupled into large-area even low-temperature plasma through interaction among charged particles; a plasma generator is fixed above the object table through the support and can achieve multi-dimensional adjustment on the aspects of the direction, position and space. A speed-adjustable electric rotary disc is integrated in the object table, and constant-speed rotational motion of a material to be treated can be achieved. Plasma generation and material treatment can be carried out in the cavity according to actual needs. The plasma jet array is generated and cooperates with electrical, optical and mechanical engineering, the material can be treated evenly at a large area, and the device can be applied to study, teaching and industrial production popularization of material surface modification.

Description

Technical field: [0001] The invention belongs to the technical field of plasma material processing, and relates to a generation and application technology of discharge plasma, in particular to a material processing device in which a plasma jet array cooperates with mechanical rotation. Background technique: [0002] With the rapid development of industrial production, the requirements for the surface properties of materials in various industrial applications are also getting higher and higher. People have adopted a variety of methods to improve the surface properties of materials to meet different applications. In recent years, material modification based on atmospheric pressure low-temperature plasma technology has been more and more widely used. Because the low-temperature plasma contains a large number of active particles such as excited atoms, molecules, and OH radicals, its reactivity is extremely strong, and it is easy to have physical and chemical reactions with the s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H05H1/24
CPCH05H1/24
Inventor 常正实陈思乐姚聪伟王帅张冠军
Owner XI AN JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products