A kind of preparation method of reusable organic gas detection film
A technology for detecting thin films and organic gases, applied in chemical instruments and methods, membrane technology, measuring devices, etc., can solve problems such as expensive instruments
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Embodiment 1
[0018] 1) Prepare the same concentration of K 3 Co(CN) 6 Hydrochloric acid aqueous solution and CoCl 2 Aqueous hydrochloric acid solution, K 3 Co(CN) 6 with CoCl 2 The concentration of the solution is 0.01M, the concentration of hydrochloric acid is 0.1M, and the PVDF non-woven fabric is cut into a suitable shape as a support;
[0019] 2) Control the ambient temperature at 25°C, immerse the support in deposition solution A for 5 minutes and take it out; then immerse the support in deionized water for 10 seconds and take it out; then immerse the support in deposition solution B for 5 minutes and take it out; finally The support was immersed in deionized water for 10 s and then taken out. The above operation was repeated 100 times. Dry the prepared film. The characterization figure of the prepared reusable organic gas detection film by scanning electron microscope (SEM) is shown in figure 1 It can be seen from the figure that the particle size of the film is uniform, and...
Embodiment 2
[0021] 1) Prepare the same concentration of K 3 Fe(CN) 6 Nitric acid aqueous solution and CoCl 2 Aqueous solution of nitric acid, K 3 Fe(CN) 6 with CoCl 2 The concentration of the solution is 0.05M, the concentration of nitric acid is 0.01M, and the ITO conductive glass support is ultrasonically cleaned with acetone, ethanol and deionized water for ten minutes respectively.
[0022] 2) Control the ambient temperature at 25°C, immerse the support in deposition solution A for 10 minutes and take it out; then immerse the support in deionized water for 10 seconds and take it out; then immerse the support in deposition solution B for 10 minutes and take it out; finally The support was immersed in deionized water for 10 s and then taken out. The above operation was repeated 80 times. Dry the prepared film.
Embodiment 3
[0024] 1) Prepare the same concentration of K 3 Co(CN) 6 Aqueous sulfuric acid solution and ZnCl 2 Aqueous solution of sulfuric acid, K 3 Co(CN) 6 with ZnCl 2 The concentration of the solution is 0.1M, the concentration of sulfuric acid is 0.5M, and the ITO conductive glass support is ultrasonically cleaned with acetone, ethanol and deionized water for ten minutes respectively.
[0025] 2) Control the ambient temperature at 35°C, immerse the support in deposition solution A for 1 min and take it out; then immerse the support in deionized water for 30 seconds and take it out; then immerse the support in deposition solution B for 1 min and take it out; finally The support was immersed in deionized water for 30 s and then taken out. The above operation was repeated 50 times. Dry the prepared film.
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