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COA substrate, color filter film, and forming method of color filter film

A color filter film and array substrate technology, applied in optics, nonlinear optics, instruments, etc., can solve the problems of sacrificing aperture ratio, increasing mask cost, etc., and achieve the effect of reducing liquid crystal bubbles

Active Publication Date: 2016-10-26
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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Problems solved by technology

[0005] The invention provides a COA substrate, a color filter film and a method for forming the color filter film, which can solve the problems of increasing the cost of the photomask and sacrificing the aperture ratio in the prior art

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  • COA substrate, color filter film, and forming method of color filter film
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  • COA substrate, color filter film, and forming method of color filter film

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Embodiment Construction

[0030] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.

[0031] see figure 1 , figure 1 It is a schematic flowchart of the first embodiment of the method for forming a color filter film in the COA process of the present invention.

[0032] A method for forming a color filter film in a COA process provided by the invention, the method comprises the following steps:

[0033] S101 , forming a color-resist layer 11 on the array substrate by using multiple color-resistors, and there is a raised overlapping area 111 between two adjacent color-resistors.

[0034] The color resistance layer 11 is formed by color resistances of different colors, for example, red color resistance, green color resistance and blue color resistance. Of course, in other embodiments, it may also include color resistances such as white color resistance. After processes such as exposure, development and curing, the edges of adja...

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Abstract

The invention provides a COA substrate, a color filter film, and a forming method of the color filter film. The method comprises following steps: adopting multiple kinds of color resistors to form a color resistance layer on an array substrate, wherein a protruding overlap region exists between two kinds of color resistors adjacent to each other; forming a passivation layer on the color resistance layer; forming light resistance layers on the passivation layers; removing light passivation layers corresponding to the overlapped regions; removing the passivation layers corresponding to the overlapped regions in order to expose color resistances in the overlapped regions. The color filter film comprises the color resistance layer and the passivation layer formed on the array substrate. The color resistance layers are formed by color resistors in multiple colors. Overlapped regions exist between two kinds of color resistors. The passivation layer, and the passivation layers at positions corresponding to the overlapped regions are removed in order to expose the color resistance layer. The COA substrate comprises the above color filter film. The COA substrate, the color filter film, and the forming method of the color filter film have following beneficial effects: liquid crystal bubbles induced by gas release are avoided after grouping pf ODF because of color resistance residuals; no additional cost is needed; and aperture opening ratio is not lowered.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a COA substrate, a color filter film and a method for forming the color filter film. Background technique [0002] At present, the formation of liquid crystal panels usually adopts the COA (Color-filter on Array) process. The COA process is to manufacture the color filter after the Array is produced on the glass of the array panel, which is the so-called color filter on the array. Color Filter On Array (Color Filter On Array) technology, which can solve the problem of high accuracy requirements for the alignment of the array substrate and the color filter substrate. [0003] However, when the COA process product forms a color filter, the residual gas in the color resistor will be released during the module assembly process, especially under certain conditions, such as high temperature or high humidity. , it is easy to produce liquid crystal bubbles, and the genera...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1362G02F1/1335
CPCG02F1/133514G02F1/133516G02F1/1362G02F1/136222
Inventor 洪日谢克成
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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