A kind of photolithography machine and method
A technology of lithography machine and exposure method, which is applied in the field of lithography machine, can solve the problems of uneven exposure, low lithography precision, single incident angle between exposure device and curved surface products, etc., so as to improve uniformity and realize high precision Effect
Active Publication Date: 2018-11-30
INST OF DONGGUAN TONGJI UNIV +1
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Problems solved by technology
When using this kind of rotary lithography machine, when it is applied to curved surface products, the movement of the X, Y, and Z axes will cause a single incident angle between the exposure device and the curved surface product, and the angles between each area of the curved surface sample and the exposure device are inconsistent, resulting in exposure. The problem of unevenness, the precision of photolithography is very low
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[0026] For ease of understanding, the technical solution of the present invention will be specifically described below in conjunction with the accompanying drawings.
[0027] Such as Figure 1-2 Shown: A photolithography machine includes a working platform, a PLC control system, an exposure device, a frame and a heating system.
[0028] The working platform includes an X-axis sliding platform 1 , a Z-axis sliding platform 2 , a sample tray 4 , a rotating motor 5 , a fixture (not shown in the figure) and a mask plate 6 . The X-axis sliding platform 1 and the Z-axis sliding platform 2 are respectively connected with motors, and the X-axis sliding platform 1 and the Z-axis sliding platform 2 are slidingly connected through a well-shaped sliding groove to realize the translation of the X-axis sliding platform 1 and the Z-axis sliding platform 2 . The second rotating motor 5 is connected to the bottom of the sample tray 4, which can drive the sample tray 4 to rotate around the ce...
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Abstract
The invention relates to a photoetching machine, in particular to a photoetching machine with a rotatable exposure device. The photoetching machine comprises working platforms, a PLC control system and the exposure device. When the photoetching machine is assembled, the X-axis sliding platform is connected with the Z-axis sliding platform through a sliding groove, the X-axis sliding platform and the Z-axis sliding platform are each connected with a motor, and translation is achieved; the exposure device is arranged on the rear position of the X axis, the exposure device is connected with the motor, and the included angle between the exposure device and the X axis can be adjusted; a tray is connected with a second motor, a curved surface product is placed on the tray and fixed with a clamp arranged on the tray, and the product is prevented from being thrown away in the rotating process. Perpendicular incidence of light rays emitted by the exposure device is achieved, the photoetching uniformity is improved, and the high precision of photoetching is achieved.
Description
technical field [0001] The invention relates to a photolithography machine, in particular to a photolithography machine with a rotatable exposure device. Background technique [0002] The rotary lithography machine in the prior art is mainly aimed at planar products. By moving along the X axis, the exposure device maintains an incident angle with the planar products to realize the exposure of the products. When using this kind of rotary lithography machine, when it is applied to curved surface products, the movement of the X, Y, and Z axes will cause a single incident angle between the exposure device and the curved surface product, and the angles between each area of the curved surface sample and the exposure device are inconsistent, resulting in exposure. The problem of unevenness, the precision of photolithography is very low. Contents of the invention [0003] In order to overcome the shortcomings and deficiencies in the prior art, the object of the present inventio...
Claims
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IPC IPC(8): G03F7/20
CPCG03F7/70066G03F7/7055G03F7/70725
Inventor 李宏强魏泽勇曾威武超林彦霆黄宇宇
Owner INST OF DONGGUAN TONGJI UNIV