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Cleaning device with film cleaning brush and cleaning method

A cleaning device and cleaning brush technology are applied in the directions of cleaning methods using tools, cleaning methods using liquids, cleaning methods and utensils, etc., and can solve problems such as easy damage to film strokes, easy inhalation by the human body, volatilization and waste of potions, and the like, Achieve the effect of reducing impact, avoiding direct contact and reducing waste

Inactive Publication Date: 2016-12-07
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the influence of human factors, there will be too much liquid medicine in some positions, which will easily damage the strokes on the film film
In addition, due to the volatile nature of film cleaning agents, pouring a large amount of film cleaning agents on the film film will not only cause a large amount of volatilization and waste of liquid medicine, but also be easily inhaled by the human body, causing harm to the body

Method used

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  • Cleaning device with film cleaning brush and cleaning method
  • Cleaning device with film cleaning brush and cleaning method
  • Cleaning device with film cleaning brush and cleaning method

Examples

Experimental program
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Embodiment Construction

[0040] In order to make the object, technical solution and advantages of the present invention more clear and definite, the present invention will be further described below with reference to the accompanying drawings and examples.

[0041] like figure 1 and figure 2 As shown, the present invention discloses a cleaning device provided with film cleaning brushes. The cleaning device mainly includes a liquid reservoir 200 for storing the prepared cleaning agent, a buffer room 300 for temporarily storing the cleaning agent, and a A cleaning brush 100 for cleaning film. Since the cleaning device is not equipped with a power system, the cleaning agent flows from top to bottom under the action of gravity, and the installation height of the liquid reservoir 200 provided by the present invention will be higher than the height of the cleaning brush 100 in use, and in order to obtain For a better cleaning effect, the cleaning brush 100 should preferably be kept in a vertical state du...

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PUM

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Abstract

The invention discloses a cleaning device with a film cleaning brush and a cleaning method of the cleaning device. The cleaning device comprises a liquid storage device, a buffering chamber and the cleaning brush. The liquid storage device is connected with the buffering chamber through a pipeline, and the buffering chamber is connected with the cleaning brush through a pipeline. A valve used for controlling the flow of a cleaning agent is further arranged between the liquid storage device and the buffering chamber. The cleaning method includes the steps that the valve is turned on and controls the cleaning agent to occupy 1 / 3-2 / 3 of the buffering chamber; the buffering chamber is pressed to exhaust bubbles in the pipelines; a brush head is pressed by repeatedly operating a sliding pressing sleeve, and the brush head is evenly wetted; the brush head is vertically placed, the valve is adjusted, and flow speed is controlled so that drops can be formed at the upper end of the buffering chamber; the film cleaning brush presses a film so that a porous elastic pad can elastically deform, the flow of the cleaning agent entering the brush head is increased, and the cleaning aim is achieved by repeatedly wiping the film. The cleaning device is simple in structure and convenient and reliable to use, can effectively prevent the cleaning agent from making direct contact with a human body and further reduces waste of the cleaning agent, and a better cleaning effect is obtained.

Description

technical field [0001] The invention relates to the technical field of film cleaning, in particular to a cleaning device provided with a film cleaning brush and a cleaning method thereof. Background technique [0002] At present, the PCB manufacturing industry is mainly based on the etching and subtractive method. Whether it is a negative film or a positive film, it is necessary to use a film film for exposure and development, so as to realize the circuit pattern. As the electronics industry develops toward small size, precision, and multi-function, printed circuit boards will also develop toward high precision in order to meet the needs of the electronics industry. When transferring computer-aided design (CAD) graphics to the film, if there is stain on the printing equipment or the film sheet, or damage and pollution are caused during transportation, the graphics of these film films need to be further repaired. In the repairing process, it is often necessary to use a film ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A46B5/00A46B11/02A46B15/00B08B1/00B08B3/08
CPCA46B5/0095A46B11/0041A46B15/0061B08B3/08A46B2200/30B08B1/143B08B1/12
Inventor 刘根范红潘湛昌张波肖俊李武义余可胡光辉肖楚民
Owner GUANGDONG UNIV OF TECH