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A kind of all-inorganic qled and preparation method thereof

An inorganic, N-type semiconductor technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of low electron mobility and low efficiency of all-inorganic QLED, achieve high electron mobility, improve electron hole, charge transport high rate effect

Active Publication Date: 2019-02-26
TCL CORPORATION
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0006] In view of the above-mentioned deficiencies in the prior art, the object of the present invention is to provide an all-inorganic QLED and its preparation method, aiming to solve the problems of low electron mobility and low efficiency of all-inorganic QLEDs in existing nitrogen-containing gallium semiconductor materials

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  • A kind of all-inorganic qled and preparation method thereof
  • A kind of all-inorganic qled and preparation method thereof

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Embodiment Construction

[0029] The present invention provides an all-inorganic QLED and a preparation method thereof. In order to make the purpose, technical solution and effect of the present invention more clear and definite, the present invention will be further described in detail below. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0030] figure 1 It is a schematic structural diagram of a preferred embodiment of an all-inorganic QLED of the present invention, as shown in the figure, including a substrate 1, an N-type semiconductor 2 deposited on the substrate 1, and deposited on steps on both sides of the N-type semiconductor 2 respectively. Quantum dots 3 and N-type electrodes 6, P-type semiconductors 4 and P-type electrodes 5 deposited on the quantum dots 3 in sequence; the N-type semiconductors are n-GeAs, n-GeSb, n-SiAs, n-SiSb A kind of; the P-type semiconductor is a kind of p-GeAs,...

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Abstract

The invention discloses a whole inorganic QLED and a preparing method thereof. The whole inorganic QLED comprises a substrate, an N-type semiconductor deposited on the substrate, a quantum dot, an N-type electrode, a P-type semiconductor and a P-type electrode, wherein the quantum dot and the N-type electrode are deposited on steps on the two sides of the N-type semiconductor respectively, and the P-type semiconductor and the P-type electrode are deposited on the quantum dot in sequence. The N-type semiconductor is prepared from one of n-GeAs, n-GeSb, n-SiAs and n-SiSb, and the P-type semiconductor is prepared from one of p-GeAs, p-GeSb, p-SiAs and p-SiSb. The semiconductor materials serve as electron and hole transmission layers of QLED devices, so that compared with structural materials based on semiconductors containing nitrogen and gallium, the electron mobility is higher, the charge transmissibility is higher, and thus the electron and hole combination rate is effectively increased; besides, by using the device structure for preparing the whole inorganic QLED, the preparing method is simple, and the service life of the devices can be effectively prolonged.

Description

technical field [0001] The invention relates to the field of quantum dot light-emitting diodes, in particular to an all-inorganic QLED and a preparation method thereof. Background technique [0002] Quantum dot light-emitting diodes (QLEDs) are expected to become the mainstream of the next generation of new display technologies due to their high device efficiency, good color purity, and low manufacturing cost. [0003] The main problem currently faced by quantum dot light-emitting diodes (QLEDs) is that the life of the device cannot meet the display requirements, especially blue light devices; the main factors for the low life of the quantum dot itself are the low life of the quantum dot itself and the polymer hole transport of the device. Layer is caused by acidity. While preparing quantum dots with good stability, in order to further improve the lifetime of QLED devices, replacing the hole transport layer of the device with metal oxide can effectively increase the lifetim...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/04H01L33/30H01L33/00
CPCH01L33/0066H01L33/04H01L33/30
Inventor 程陆玲杨一行
Owner TCL CORPORATION